Conformal Deposition of High-Purity Copper Using Plasma Reactor with H Atom Source
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概要
- 論文の詳細を見る
We have studied the effects of H atoms on the removal of impurities in Cu thin films for plasma chemical vapor deposition (CVD) from Cu(hfac)_2. In situ Fourier transform infrared (FT-IR) spectroscopic measurements show that H atoms are very effective in removing impurities in the film for substrate temperatures above 70℃. While H atoms are important to obtain high-purity Cu films, deposition rate and film conformality presumably depends on Cu-containing radicals, which are closely related to the degree of dissociation of Cu(hfac)_2. Therefore, we have also demonstrated independent control of both concentration of H atoms and the degree of dissociation of Cu(hfac)_2 by using a plasma CVD reactor equipped with an H atom source. Excellent film coverage of above 95% in a trench 0.4 μm wide and 3.25 μm deep is realized by their control.
- 社団法人応用物理学会の論文
- 1999-07-30
著者
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渡部 行男
九大院理
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Watanabe Yoshihide
Department Of Electronics Faculty Of Engineering Tottori University
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渡部 行男
九州工業大学工学部電気工学科
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Shiratani M
Department Of Electronics Graduate School Of Information Science And Electrical Engineering Kyushu U
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Shiratani Masaharu
Department Of Electoronics Kyushu University
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Watanabe Yukio
Department Of Electrical Engineering Sciences Faculty Of Engineering Sciences Kyushu University
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Jin Hong
Department Of Electrical And Electronic Engineering Yonsei University
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Jin Hong
Dept.of Electronic Device Eng. Grad.school Of Information Science And Electrical Eng. Kyushu Univ.
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TOYOFUKU Masaharu
Department of Electrical Engineering, Fukuoka Institute of Technology
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Kinoshita T
Kyushu Univ. Fukuoka Jpn
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FUKUZAWA Tsuyoshi
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical E
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Nakatake Yasuhiro
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical E
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Kinoshita Toshio
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical E
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Fukuzawa Tsuyoshi
Department Of Electronic Device Engineering Graduate School Of Information Science And Electrical En
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Toyofuku Masaharu
Department Of Electrical Engineering Fukuoka Institute Of Technology
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Toyofuku Masaharu
Department Of Electrical And Electronic Engineering Saga University
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Watanabe Yukio
Department Of Electrical Engineering Faculty Of Engineering Kyushu University
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Kinoshita Toshio
Department Of Analytical Chemistry School Of Pharmaceutical Science Kitasato University
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Shiratani Masaharu
Department of Electoronics, Kyushu University
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Fukuzawa Tsuyoshi
Department of Electronic Device Engineering, Graduate School of Information Science and Electrical Engineering, Kyushu University
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