Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
スポンサーリンク
概要
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We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductance antenna (LIA) units and analyzed the plasma density profile of this source using fluid simulation. Experiments using four LIA units showed a stable source operation even at 2000 W RF power, attaining plasma densities as high as $10^{11}$–$10^{12}$ cm-3 in an argon pressure range of 0.67–2.6 Pa. The amplitude of antenna RF voltage was measured to be less than 600 V, which is considerably smaller than those obtained using conventional ICP antennas. The radial distribution of plasma density sustained using four LIA units showed excellent agreement with profiles numerically predicted using a fluid-simulation code.
- 2006-10-30
著者
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Takahashi Kazuo
Department Of Advanced Medical Technology And Development Bml Inc.
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EBE Akinori
EMD Corp.
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NISHISAKA Kazuaki
EMD Corporation
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Sugiura Shinya
Department Of Cardiology Mie University Graduate School Of Medicine
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Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
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Takenaka Kosuke
Joining And Welding Research Institute Osaka University
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Ono Koichi
Department Of Anesthesia Nagano Municipal Hospital
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Ono Koichi
Department of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
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Nishisaka Kazuaki
EMD Corporation, Nishikyo-ku, Kyoto 615-8245, Japan
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Ebe Akinori
EMD Corporation, Nishikyo-ku, Kyoto 615-8245, Japan
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Sugiura Shinya
Department of Cardiology and Nephrology, Mie University Graduate School of Medicine
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Takahashi Kazuo
Department of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
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