Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-07-30
著者
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SHOJI Tadayoshi
Department of Electronics, Tohoku Institute of Technology
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節原 裕一
国立大学法人大阪大学接合科学研究所
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SETSUHARA Yuichi
Joining and Welding Research Institute, Osaka University
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MIYAKE Shoji
Joining and Welding Research Institute, Osaka University
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Shoji T
Department Of Electronics Tohoku Institute Of Technology
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KUMAGAI Masao
Kanagawa Industrial Technology Research Institute
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MUSIL Jindrich
Department of Physics, University of West Bohemia
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Shoji Tatsuo
Department Of Energy Engineering And Science Nagoya University
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Kumagai M
Kanagawa Industrial Technology Research Institute
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Musil Jindrich
Department Of Physics University Of West Bohemia
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Musil Jindrich
Department Of Physics Faculty Of Applied Science University Of West Bohemia
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Kamai Masayoshi
Joining And Welding Research Institute Osaka University
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Yamashita Masahiro
Joining and Welding Research Institute, Osaka University
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Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
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Yamashita Masahiro
Joining And Welding Research Institute Osaka University
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Kumagai Masao
Kanagawa High-Technology Foundation, Kanagawa Science Park, Kawasaki, Kanagawa 213, Japan
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Shoji Tatsuo
Department of Electronics, Tohoku Institute of Technology
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