Characteristics of an ECR Plasma Sputtering Source at Low Ar/N_2 Gas Pressures for Thin Film Synthesis
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-01
著者
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MIYAKE Shoji
Joining and Welding Research Institute, Osaka University
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Shoyama Hiroaki
Joining And Welding Research Institute Osaka University
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MISINA Martin
Institute of Physics, Academy of Sciences of The Czech Republic
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Misina Martin
Institute Of Physics Academy Of Sciences Of The Czech Republic
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