Application of Millimeter-Wave Heating to Materials Processing(<Special Issue>Recent Trends on Microwave and Millimeter Wave Application Technology)
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概要
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Recently, millimeter-wave energy has attracted much attention as a new and novel energy source for materials processing. In the present paper, several unique features of millimeter-wave heating in materials processing are reviewed briefly and development of materials processing machines by mm-wave radiation is also described. In the application of mm-wave heating, sintering of high quality alumina ceramics having a high bending strength of about 800 Mpa are first demonstrated and followed by preparation of aluminum nitride with a high thermal conductivity over 200 W/(mK) at a sintering temperature lower by 473-573K than the conventional.method, by which this processing can be expected to be one of the environment-conscious energy saving processes. A newly developed post-annealing process with mm-wave radiation is described, in which crystallization of amorphous perovskite oxide films prepared by plasma sputtering was attained at temperatures lower than that by the conventional heating and the dielectric constant of post-annealed SrTiO_3 (STO) films by mm-wave radiation were drastically improved.
- 一般社団法人電子情報通信学会の論文
- 2003-12-01
著者
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MAKINO Yukio
Joining & Welding Research Institute, Osaka University
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Makino Yukio
Joining And Welding Research Institute Osaka University
関連論文
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- Dense Nano-structured and Preferentially-oriented Anatase Synthesized by Pulsed High Current Heating
- Densification Behavior and Crystallite Growth in Alumina-YSZ Composites Sintered by Millimeter-wave Heating
- OS8(P)-28(OS08W0211) A Study on the Mechanical Properties of Silicon Nitride Ceramics Sintered by 28GHz Millimeter-Wave Heating Method
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Morphology and Microstructure of Hard and Superhard Zr-Cu-N Nanocomposite Coatings
- Zr-based Hydrogen Absorbing Films Prepared by Ion Beam Assisted Deposition(Physics, Processes, Instruments & Measurements)
- Estimation of Homogeneity in Pulsed High Current Sintering by Crystallographic Character of Consolidated Anatase
- Tribological Property of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Hydroxyapatite Coating on Titanium Plate with an Ultrafine Particle Beam
- Consolidation behavior and mechanical properties of SiC with Al2O3 and Yb2O3 consolidated by SPS (特集 電磁プロセスのナノ構造機能材料への応用)
- Influence of Phase Change in Intergranular Oxides to Thermal Conductivity of AIN Sintered by Millimeter-Wave Heating
- Influence of RF Power Supply on ElEctron-Cyclotron-Resonance Plasma with Mirror Confinement for SrTiO_3 Thin Film Formation
- Examination of Meek's Model for Microwave Sintering Mechanism (特集 電磁エネルギー焼結)
- Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering
- Decomposition Rate of Si_3N_4 during Microwave Sintering
- Ion Assisted Deposition of Crystalline TiNi Films by electron Cyclotron Resonance Plasma Enhanced Sputtering
- Characteristics of an ECR Plasma Sputtering Source at Low Ar/N_2 Gas Pressures for Thin Film Synthesis
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
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- Fabrication of high thermal conductive aluminum/graphitic fiber composites by pulsed electric current sintering (特集 電磁プロセスの新展開)
- Kinetics of Densification and Phase Transformation at Microwave Sintering of Silicon Nitride with Alumina and Yttria or Ytterbia as Additives (特集 放電焼結の基礎と応用)
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- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma