Examination of Meek's Model for Microwave Sintering Mechanism (特集電磁エネルギー焼結)

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Hydroxyapatite Coating on Titanium Plate with an Ultrafine Particle Beam
Consolidation behavior and mechanical properties of SiC with Al2O3 and Yb2O3 consolidated by SPS (特集電磁プロセスのナノ構造機能材料への応用)
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Influence of RF Power Supply on ElEctron-Cyclotron-Resonance Plasma with Mirror Confinement for SrTiO_3 Thin Film Formation
Examination of Meek's Model for Microwave Sintering Mechanism (特集電磁エネルギー焼結)
Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering
Decomposition Rate of Si_3N_4 during Microwave Sintering
Ion Assisted Deposition of Crystalline TiNi Films by electron Cyclotron Resonance Plasma Enhanced Sputtering
Characteristics of an ECR Plasma Sputtering Source at Low Ar/N_2 Gas Pressures for Thin Film Synthesis
Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
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Consolidation of Ultrafine Alumina Powders with SPS Method
Fabrication of high thermal conductive aluminum/graphitic fiber composites by pulsed electric current sintering (特集電磁プロセスの新展開)
Kinetics of Densification and Phase Transformation at Microwave Sintering of Silicon Nitride with Alumina and Yttria or Ytterbia as Additives (特集放電焼結の基礎と応用)
Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna
Application of Millimeter-Wave Heating to Materials Processing(Recent Trends on Microwave and Millimeter Wave Application Technology)
Application of Band Parameters to Materials Design
Fabrication of Bulk Ceramics by High-Power Millimeter-Wave Radiation
Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO3 Thin Film Preparation
Hydroxyapatite Coating on Titanium Plate with an Ultrafine Particle Beam
Millimeter-Wave Annealing of SrBi2Ta2O9 Films Prepared by Sol–Gel Method
Structure and Properties of Ti–Si–N Films Deposited by dc Magnetron Cosputtering on Positively Biased Substrates
Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition
Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma

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