Decomposition Rate of Si_3N_4 during Microwave Sintering
スポンサーリンク
概要
- 論文の詳細を見る
- 粉体粉末冶金協会の論文
- 2003-12-15
著者
-
MAKINO Yukio
Joining & Welding Research Institute, Osaka University
-
MIYAKE Shoji
Joining and Welding Research Institute, Osaka University
-
Miyake S
Joining And Welding Research Institute Osaka University
-
Miyake Shoji
Joining And Welding Research Institute Osaka University
-
Miyake Shoji
Joining & Welding Resarch Institute Osaka University
-
Makino Y
Joining And Welding Research Institute Osaka University
-
SAJI Tasaburo
Joining and Welding Research Institute, Osaka University
-
Saji Tasaburo
Joining And Welding Research Institute Osaka University
関連論文
- Characterization of zirconia (3Y)/SUS410L functionally-graded material fabricated by SPS processing (特集 新成形法,新焼結法と自動車への応用について)
- Low Temperature Millimeter-Wave Sintering of Aluminum Nitride with Oxide Additive of CaO-Al_2O_3-Yb_2O_3 System
- Dense Nano-structured and Preferentially-oriented Anatase Synthesized by Pulsed High Current Heating
- Densification Behavior and Crystallite Growth in Alumina-YSZ Composites Sintered by Millimeter-wave Heating
- OS8(P)-28(OS08W0211) A Study on the Mechanical Properties of Silicon Nitride Ceramics Sintered by 28GHz Millimeter-Wave Heating Method
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO_3 Thin Film Preparation
- Morphology and Microstructure of Hard and Superhard Zr-Cu-N Nanocomposite Coatings
- Zr-based Hydrogen Absorbing Films Prepared by Ion Beam Assisted Deposition(Physics, Processes, Instruments & Measurements)
- Estimation of Homogeneity in Pulsed High Current Sintering by Crystallographic Character of Consolidated Anatase
- Tribological Property of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Hydroxyapatite Coating on Titanium Plate with an Ultrafine Particle Beam
- Consolidation behavior and mechanical properties of SiC with Al2O3 and Yb2O3 consolidated by SPS (特集 電磁プロセスのナノ構造機能材料への応用)
- Influence of Phase Change in Intergranular Oxides to Thermal Conductivity of AIN Sintered by Millimeter-Wave Heating
- Influence of RF Power Supply on ElEctron-Cyclotron-Resonance Plasma with Mirror Confinement for SrTiO_3 Thin Film Formation
- Examination of Meek's Model for Microwave Sintering Mechanism (特集 電磁エネルギー焼結)
- Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering
- Decomposition Rate of Si_3N_4 during Microwave Sintering
- Ion Assisted Deposition of Crystalline TiNi Films by electron Cyclotron Resonance Plasma Enhanced Sputtering
- Characteristics of an ECR Plasma Sputtering Source at Low Ar/N_2 Gas Pressures for Thin Film Synthesis
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Inductively-Coupled-Plasma-Assisted Planar Magnetron Discharge for Enhanced Ionization of Sputtered Atoms
- Consolidation of Ultrafine Alumina Powders with SPS Method
- Fabrication of high thermal conductive aluminum/graphitic fiber composites by pulsed electric current sintering (特集 電磁プロセスの新展開)
- Kinetics of Densification and Phase Transformation at Microwave Sintering of Silicon Nitride with Alumina and Yttria or Ytterbia as Additives (特集 放電焼結の基礎と応用)
- Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna
- Application of Millimeter-Wave Heating to Materials Processing(Recent Trends on Microwave and Millimeter Wave Application Technology)
- Application of Band Parameters to Materials Design
- Fabrication of Bulk Ceramics by High-Power Millimeter-Wave Radiation
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO3 Thin Film Preparation
- Hydroxyapatite Coating on Titanium Plate with an Ultrafine Particle Beam
- Millimeter-Wave Annealing of SrBi2Ta2O9 Films Prepared by Sol–Gel Method
- Structure and Properties of Ti–Si–N Films Deposited by dc Magnetron Cosputtering on Positively Biased Substrates
- Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma