Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
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概要
- 論文の詳細を見る
Planar magnetron discharge is assisted by inductively coupled plasmas, which are sustained by a helical RF antenna immersed in the plasma. Use of the technique significantly enhances the plasma density. The effects of antenna termination when grounded or floating have been investigated by a simple circuit analysis. The floating antenna configuration effectively suppresses the anomalous rise of the plasma potential and thus the plasma source can be stably operated at a higher input of RF power to generate plasmas with densities as high as >1012 cm-3.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1999-07-30
著者
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Miyake Shoji
Joining & Welding Resarch Institute Osaka University
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Shoji Tatsuo
Department Of Energy Engineering And Science Nagoya University
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Musil Jindrich
Department Of Physics Faculty Of Applied Science University Of West Bohemia
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Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
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Yamashita Masahiro
Joining And Welding Research Institute Osaka University
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Kumagai Masao
Kanagawa High-Technology Foundation, Kanagawa Science Park, Kawasaki, Kanagawa 213, Japan
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Musil Jindrich
Department of Physics, University of West Bohemia, Plzen, Czech Republic
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Shoji Tatsuo
Department of Electronics, Tohoku Institute of Technology
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Miyake Shoji
Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Japan
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