Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
-
節原 裕一
国立大学法人大阪大学接合科学研究所
-
SETSUHARA Yuichi
Joining and Welding Research Institute, Osaka University
-
HAYASHI Tsukasa
Nissin Electric Co.
-
Hayashi Tsukasa
Nissin Electric Co. Ltd R&d Laboratories
-
OGATA Kiyoshi
Nissin Electric Co., Ltd. Process Research Center R&D Laboratories
-
KUBOTA Kiyoshi
Nissin Electric Co., Ltd, R&D Laboratories
-
EBE Akinori
EMD Corp.
-
TAKENAKA Kosuke
Joining and Welding Research Institute, Osaka University
-
DEGUCHI Hiroshige
Nissin Electric Co., Ltd., R&D Laboratories
-
YONEDA Hitoshi
Nissin Electric Co., Ltd., R&D Laboratories
-
KATO Kenji
Nissin Electric Co., Ltd., R&D Laboratories
-
Kubota Kazuyoshi
Atr Adaptive Communications Research Laboratories
-
Ogata Kiyoshi
Nissin Electric Co. Ltd. Kyoto Jpn
-
Ogata Kiyoshi
Nissin Electric Co. Ltd R&d Laboratories
-
Yoneda Hitoshi
Nissin Electric Co. Ltd. R&d Laboratories
-
Kubota Kiyoshi
Nissin Electric Co. Ltd R&d Laboratories
-
Hayashi Tsukasa
Nissin Electric Co. Ltd. R&d Laboratories
-
Setsuhara Yuichi
Osaka University Joining And Welding Research Institute
-
Setsuhara Yuichi
Joining And Welding Research Institute Osaka University
-
Takenaka Kosuke
Joining And Welding Research Institute Osaka University
-
Deguchi Hiroshige
Nissin Electric Co. Ltd. R&d Laboratories
-
Kato Kenji
Nissin Electric Co. Ltd. R&d Laboratories
関連論文
- 低インダクタンス内部アンテナを用いた大口径誘導結合RFプラズマ生成
- プラズマ・プロセス技術
- イオンビーム支援蒸着法を用いたCeO_2薄膜合成におけるモルフォロジーに及ぼすイオン照射効果
- フェムト秒レーザーを用いた半導体微細加工
- ヘリコン波励起プラズマスパッタリングによるCN_x薄膜合成
- 誘導結合型フルオロカｰボンプラズマを用いた高誘電率HfO_2薄膜のエッチング
- プラズマCVDと溶媒処理を用いたフルオロカーボン系多孔質構造Low-K薄膜の作成
- Combinatorial Plasma Etching Process
- Diffusion Barrier Effect of Ultra-Thin Photo-Nitrided a-Si:H Overlayer on SnO_2/Glass Substrate
- 低インダクタンス内部アンテナを用いたプラズマ源の開発と反応性プラズマプロセスへの展開 (小特集 実用化プロセスにおけるプラズマ源の革新--平行平板プラズマ源から新プラズマ源へ)
- 327 イオンビーム支援蒸着法によるc-BN薄膜の合成
- 326 c-BN薄膜合成におけるイオンビームを用いた界面制御
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Mechanical Property of Dissimilar Material Nanocomposites Prepared by Ion Beam Assisted Sputtering Process(Physics, Processes, Instruments & Measurements)
- Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition
- Morphology and Microstructure of Hard and Superhard Zr-Cu-N Nanocomposite Coatings
- 研究開発の効率を飛躍的に高めるコンビナトリアルプラズマ解析装置 (特集 プラズマ技術の新しい挑戦)
- 4. マルチ低インダクタンス内部アンテナを用いた次世代メートル級大面積プロセスに向けたプラズマ生成制御技術(プラズマと電磁波の相互作用の新規応用 : 空間的・時間的デザインが拓く新機能)
- 21406 マルチアンテナ型RFプラズマによるメートル級大面積での低ダメージプロセスと制御(基調講演,デバイス&配線技術2,OS.1 機械工学が支援する微細加工技術(半導体・MEMS・NEMS),学術講演)
- Characterization of ion energy distribution in inductively coupled argon plasmas sustained with multiple internal-antenna units (Special issue: Dry process)
- Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna
- Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
- Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units
- メートルサイズの大面積プロセスに向けたプラズマ技術
- 次世代メートルサイズ大面積プロセス用プラズマ源
- フェムト秒レーザーによる物質プロセッシング
- Zr-based Hydrogen Absorbing Films Prepared by Ion Beam Assisted Deposition(Physics, Processes, Instruments & Measurements)
- プラズマ源の開発
- ミリ波によるセラミックス加熱・焼結 (特集 セラミックス電磁プロセシングの動向)
- Tribological Property of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- 酸化物薄膜創成におけるミラー型ECRプラズマに及ぼすRFバイアス効果
- Array of Micromachined Components Fabricated Using "Micro-Origami" Method
- 6.低インダクタンス内部アンテナを用いたプラズマ源の開発と反応性プラズマプロセスへの展開(実用化プロセスにおけるプラズマ源の革新〜平行平板プラズマ源から新プラズマ源へ〜)
- Properties of (Ti, Al) N films prepared by ion beam assisted deposition(Physics, Process, Instrument & Measurements)
- Low-Temperature Microcrystalline Silicon Film Deposited by High-Density and Low-Potential Plasma Technique Using Hydrogen Radicals
- Formation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering
- Ion Assisted Deposition of Crystalline TiNi Films by electron Cyclotron Resonance Plasma Enhanced Sputtering
- Helicon Wave Plasma Enhanced Sputtering and Application to Synthesis of Carbon Nitride Films(Physics, Process, Instrument & Measurements)
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
- Inductively-Coupled-Plasma-Assisted Planar Magnetron Discharge for Enhanced Ionization of Sputtered Atoms
- Use of Focused High-Power 60-GHz Radiation Beams for Advanced Sintering of Ceramics(Physics, Processes, Instruments & Measurements)
- Combinatorial Analysis of Plasma–Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy
- Influence of Ion Irradiation on Crystalline Phases of Oxide Films(Materials, Metallurgy & Weldability)
- Ti-Al Alloy Films Synthesized by Ion-Beam-Enhanced Deposition(Physics, Process, Instrument & Measurements)
- 泥しょう鋳込み法により作製したZrO_2-3mol%Y_2O_3成形体のマイクロ波焼結
- 336 誘導結合型プラズマスパッタリングの研究
- Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna
- 342 マイクロ波を利用したセラミックス焼結の研究
- Simulation-Aided Designing of Meter-Scale Large-Area Plasma Source with Multiple Low-Inductance Antenna Modules
- Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Surface Modification of Polyimide for Improving Adhesion Strength by Inductively Coupled Plasma
- Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition (Special Issue : Dry Process)
- フレキシブルデバイス創製に向けたプラズマ-ソフトマテリアル相互作用の解析
- 表面機能化プロセス
- プラズマ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜 (特集 革新的プラズマ科学の新潮流)
- Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films Using Solution of Zinc Acetate
- フレキシブルデバイス創製に向けたプラズマーソフトマテリアル相互作用の解析
- H2/N2 Plasma Etching Rate of Carbon Films Deposited by H-Assisted Plasma Chemical Vapor Deposition
- スマートプロセス学会 表界面プロセス部会
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Characterization of Ion Energy Distribution in Inductively Coupled Argon Plasmas Sustained with Multiple Internal-Antenna Units
- Low Temperature Polycrystalline Silicon Thin Film Transistors Flash Memory with Silicon Nanocrystal Dot
- Self-Assembly of Microstage Using Micro-Origami Technique on GaAs
- Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
- Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition
- Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface
- イオン・プラズマプロセスによる硼素,炭素,窒素系超硬質薄膜の合成
- イオン照射を利用した成膜プロセスの評価法
- 234 ヘリコンプラズマスパッタリングによるCN_x薄膜合成
- Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films
- Tribological Property of CeO2 Films Prepared by Ion-Beam-Assisted Deposition
- Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization