21406 マルチアンテナ型RFプラズマによるメートル級大面積での低ダメージプロセスと制御(基調講演,デバイス&配線技術2,OS.1 機械工学が支援する微細加工技術(半導体・MEMS・NEMS),学術講演)

概要

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Plasma technologies for meters-scale large-area processes have been developed using multiple low-inductance antenna (LIA) modules to drive inductively coupled plasmas (ICPs), in which RF-power-deposition profiles can be controlled in plasma reactors with a scale as large as meters. The LIA module consisted of a U-shaped internal antenna conductor, which was entirely covered with dielectric tubing for complete isolation from plasmas, with a scale length much shorter than the propagation wavelength of the RF power. Our new proposal of the unique source configuration is based on the principle of multiple operation and integrated control of LIA modules, which allow low-voltage operation of ICPs for low-damage high-quality process and high-density plasma production with active control of power deposition profiles to control plasma profiles. The obtained results indicated that the plasma production and control technologies with the LIA modules are quite attractive as a high-density low-damage plasma source for large-area processes.
一般社団法人日本機械学会の論文
2008-03-13