Hori Masaru | Graduate School Of Engineering Nagoya University

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概要

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著作論文

New Compact Continuous Spectrum Light Source Using Atmospheric Pressure Microplasma with High-Velocity Ar Gas Flow
Growth of Preferentially Oriented Microcrystalline Silicon Film Using Pulse-Modulated Ultrahigh-Frequency Plasma
Behaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2--H2 Mixture Plasmas
Combinatorial Analysis of Plasma–Surface Interactions of Poly(ethylene terephthalate) with X-ray Photoelectron Spectroscopy
Impacts of CF+, CF2+, CF3+, and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist
Line-Profiles and Translational Temperatures of Pb Atoms in Multi-Micro Hollow Cathode Lamp Measured by Diode Laser Absorption Spectroscopy
Properties of Indium--Zinc-Oxide Films Synthesized by Radio Frequency Magnetron Sputtering Based on Gas Phase Monitoring Using Multi-Micro Hollow Cathode Lamp
Highly Selective Etching of SiO2 over Si3N4 and Si in Capacitively Coupled Plasma Employing C5HF7 Gas
A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface
High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System
High H Radical Density Produced by 1-m-Long Atmospheric Pressure Microwave Plasma System (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
A High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface

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