SAMUKAWA Seiji | Institute of Fluid Science, Tohoku University
スポンサーリンク
概要
関連著者
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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Samukawa Seiji
Institute Of Fluid Science Tohoku University
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Samukawa S
Tohoku Univ. Sendai Jpn
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Samukawa Seiji
Process Development Department Vlsi Development Division Nec Corporation
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ISHIKAWA Yasushi
Institute of Fluid Science, Tohoku University
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Nakamura T
Hokkaido Univ. Sapporo Jpn
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HUANG Chi-Hsien
Institute of Fluid Science, Tohoku University
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SAMUKAWA Seiji
VLSI Development Division, NEC Corporation
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ENDO Kazuhiko
National Institute of Advanced Industrial Science and Technology
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Nakamura Tetsuro
Department Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Nakamura Toshihiko
Faculty Of Engineering Tokyo Institute Of Technology
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Okigawa Mitsuru
Sanyo Electric Co. Ltd.
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Ishitani A
O Ntt Atsugi R&d Center:(permanant Address)semiconductor Company Matsushita Electronics Corporat
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Huang Chi-hsien
Institute Of Fluid Science Tohoku University
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Ishikawa Yasushi
Institute Of Fluid Science Tohoku University
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Yamashita Ichiro
Graduate School Of Materials Science Nara Institute Of Science And Technology
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浦岡 行治
奈良先端科学技術大学院大
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URAOKA Yukiharu
Graduate School of Materials Science, Nara Institute of Science and Technology
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FUYUKI Takashi
Graduate School of Materials Science, Nara Institute of Science and Technology
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IGARASHI Makoto
Institute of Fluid Science, Tohoku University
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KUBOTA Tomohiro
Institute of Fluid Science, Tohoku University
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NAKAMURA Tsuyoshi
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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Ishida Tadashi
National Institute Of Advanced Industrial Science And Technology
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MASAHARA Meishoku
National Institute of Advanced Industrial Science and Technology
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Ishida Toshimasa
Research Laboratory Oki Electric Industry Co. Lid
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Endo Kazuhiko
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Ishida Takayuki
Department Of Radiology National Federation Of Health Insurance Societies Osaka Chuo Hospital
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Ishida T
Department Of Physics Faculty Of Science Ibaraki University
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Igarashi Makoto
Institute Of Fluid Science Tohoku University
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Nakamura Tsuyoshi
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Fuyuki Takashi
Graduate School Of Material Science Nara Institute Of Science And Technology
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Huang Chi‐hsien
Institute Of Fluid Science Tohoku University
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Uraoka Yukiharu
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Nakamura Tsuyoshi
Mechatronics Research Laboratory Nec Corporation
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Fuyuki Takashi
Nara Inst. Sci. And Technol. Nara Jpn
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Kubota Tomohiro
Institute Of Fluid Science Tohoku University
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Uraoka Yukiharu
Graduate School of Material Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
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深沢 塔一
金沢工業大学機械系
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Ishikawa Yuki
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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NISHIOKA Kensuke
School of Materials Science, Japan Advanced Institute of Science and Technology
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TAKEGUCHI Masaki
High Voltage Electron Microscopy Station, National Institute for Materials Science
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ISHIDA Toshinori
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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ISHITANI Akihiko
VLSI Development Division, NEC Corporation
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中川 吉郎
大阪市立大学
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Ikeda K
Mitsubishi Electric Corp. Hyogo Jpn
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Maeda T
Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Takeguchi Masaki
High Voltage Electron Microscopy Station National Institute For Materials Science
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NODA Shuichi
Institute of Fluid Science, Tohoku University
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OZAKI Takuya
Institute of Fluid Science, Tohoku University
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LIU Yongxun
National Institute of Advanced Industrial Science and Technology
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ISHII Kenichi
National Institute of Advanced Industrial Science and Technology
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TAKASHIMA Hidenori
National Institute of Advanced Industrial Science and Technology
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SUGIMATA Etsuro
National Institute of Advanced Industrial Science and Technology
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MATSUKAWA Takashi
National Institute of Advanced Industrial Science and Technology
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YAMAUCHI Hiromi
National Institute of Advanced Industrial Science and Technology
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ISHIKAWA Yuki
National Institute of Advanced Industrial Science and Technology
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SUZUKI Eiichi
National Institute of Advanced Industrial Science and Technology
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Ikeda Keisuke
Institute For Materials Research Tohoku University
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Nakagawa Y
Yamanashi Univ. Kofu Jpn
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ICHIKI Katsunori
Ebara Research Co., Ltd.
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Ozaki Takuya
Institute Of Fluid Science Tohoku University
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Ikeda Keiji
Department Of Physical Electronics Tokyo Institute Of Technology
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Ishii K
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Suzuki E
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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中川 吉郎
大阪市立大・工
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Nishioka Kensuke
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Matsumura Takashi
High Voltage Electron Microscopy Station National Institute For Materials Science
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Yamauchi Hiroshi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Fuyuki T
Nara Inst. Sci. And Technol. Nara Jpn
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Kato Yuji
Institute Of Fluid Science Tohoku University
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ICHIHASHI Yoshinari
Institute of Fluid Science, Tohoku University
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SHIMIZU Ryu
Sanyo Electric Co., Ltd.
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SAKAMOTO Keisuke
Institute of Fluid Science, Tohoku University
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Shimizu Ryu
Sanyo Electric Co. Ltd.
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Ishitani Akihiko
Vlsi Development Division Nec Corporation
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Ichihashi Yoshinari
Institute Of Fluid Science Tohoku University
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Ichiki Katsunori
Ebara Research Co. Ltd.
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Sakamoto Keisuke
Institute Of Fluid Science Tohoku University
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寒川 誠二
東北大学 流体科学研究所 知的ナノプロセス研究分野
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MINEMURA Youichi
Institute of Fluid Science, Tohoku University
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FUKUDA Seiichi
Semiconductor Netwark Company, Sony Corporation
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Chen Jem-kun
Institute Of Fluid Science Tohoku University
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堀 勝
名古屋大学大学院工学研究科電子情報システム専攻
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Morie Takashi
Graduate School Of Life Science And Systems Engineering Kyushu Institute Of Technology
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HASHIMOTO Takeshi
Institute of Fluid Science, Tohoku University
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FUYUKI Takashi
Nara Institute of Science and Technology
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YAMASHITA Ichiro
Nara Institute of Science and Technology
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SAMUKAWA Seiji
Microelectronics Research Laboratories, NEC Corporation
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NAKAMURA Tsuyoshi
FA Development Laboratories, NEC Corporatton
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ISHIDA Toshinori
FA Development Laboratories, NEC Corporatton
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ISHITANI Akihiko
ULSI Device Development Laboratories, NEC Corporation
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SAMUKAWA Seiji
Process Development Department, VLSI Development Division, NEC Corporation
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ISHITANI Akihiko
Process Development Department, VLSI Development Division, NEC Corporation
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KAWASE Yutaka
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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Goto T
Graduate School Of Pharmaceutical Sciences Tohoku University
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Goto Takaaki
Department Of Electric Engineering Tokyo University Of Agriculture And Technology
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Fukuda Seiichi
Institute Of Fluid Science Tohoku University
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Fukuda Seiichi
Semiconductor Netwark Company Sony Corporation
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IKOMA Toru
Institute of Fluid Science, Tohoku University
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TAGUCHI Chihiro
Institute of Fluid Science, Tohoku University
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WATANABE Heiji
Graduate School of Engineering, Osaka University
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YAMASAKI Satoshi
Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
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Hori Masaru
Graduate School Of Engineering Nagoya University
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Hori Masaru
School Of Engineering Nagoya University
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Yamauchi Hiromi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Murata Kazuya
Graduate School Of Science Osaka City University
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OKIGAWA Mitsuru
Institute of Fluid Science, Tohoku University
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Taguchi Chihiro
Institute Of Fluid Science Tohoku University
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SAMUKAWA Seiji
LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation
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NAKAGAWA Yukito
Anelva Corporation
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IKEDA Kei
ANELVA Corporation
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NAKAGAWA Yukito
ANEL VA Corporation
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IKEDA Kei
ANEL VA Corporation
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Morimoto Yukihiro
Fundamental Research Department R&d Center Lamp Company Ushio Inc .
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Suzuki Eiichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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HADA Hiromitsu
System Devices Research Laboratories, NEC Corporation
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TADA Shigekazu
Department of Quantum Engineering, Nagoya University
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Wada Akira
Institute Of Fluid Science Tohoku University
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Ikoma Toru
Institute Of Fluid Science Tohoku University
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Noda Shuichi
Institute Of Fluid Science Tohoku University
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Hikono Takio
Institute Of Fluid Science Tohoku University
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Kawase Yutaka
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Hada Hiromitsu
System Devices Research Laboratories Nec Corporation
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Hada Hiromitsu
System Devices And Fundamental Research Nec Corporation
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Kumagai Shinya
Institute Of Fluid Science Tohoku University
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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KITAJIMA Takeshi
Department of Electrical Engineering, Faculty of Science and Technology, Keio University
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Tsukada T
Tdk Corp. Chiba Jpn
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Kitajima Takeshi
Department Of Electrical And Electronic Engineering National Defense Academy
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NAKANO Toshiki
Department of Electrical and Electronic Engineering, National Defense Academy
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TAKAIRA Seiichi
Department of Electrical and Electronic Engineering, National Defense Academy
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Samukawa Seiji
Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation
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Nakano Toshiki
Department Of Electrical And Electronic Engineering National Defense Academy
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MIZUHARA Hideki
Sanyo Electric Co., Ltd.
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ISHIKAWA Yasushi
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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KATOH Yuji
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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OKIGAWA Mitsuru
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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SAMUKAWA Seiji
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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MIZUTANI Yuko
Graduate School of Engineering, Nagoya University
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IWASAKA Emi
Graduate School of Engineering, Nagoya University
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TAKASHIMA Seigou
Graduate School of Engineering, Nagoya University
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GOTO Toshio
Graduate School of Engineering, Nagoya University
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TSUKADA Tsutomu
Semiconductor Equipment Division, Anelva Corporation
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Sakakibara T
Department Of Quantum Engineering Nagoya University
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後藤 俊夫
Imram Tohoku University
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Murata Kazuya
Graduate School Of Engineering Nagoya University
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Iwasaka Emi
Graduate School Of Engineering Nagoya University
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Mizutani Yuko
Graduate School Of Engineering Nagoya University
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Liu Yongxun
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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Mizuhara Hideki
Sanyo Electric Co. Ltd.
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JINNAI Butsurinn
Institute of Fluid Science, Tohoku University
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ODA Fumihiko
Fundamental Research Department, R&D Center, Lamp Company, Ushio Inc .
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Ishitani Akihiko
Ulsi Device Development Laboratories Nec Corporation
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Ohshima Norikazu
System Devices Research Laboratories Nec Corporation
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Jinnai Butsurinn
Institute Of Fluid Science Tohoku University
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Takashima Hidenori
National Institute Of Advanced Industrial Science And Technology (aist)
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Sugimata Etsuro
National Institute Of Advanced Industrial Science And Technology (aist)
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Samukawa Seiji
Microelectronics Research Laboratories Nec Corporation
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Yamashita Ichiro
Crest Japan Science And Technology Agency
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Yamasaki Satoshi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology Aist
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Yamasaki Satoshi
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Mukai Tomonori
Institute Of Fluid Science Tohoku University
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Matsukawa Takashi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology
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MUKAI Tomonori
System Devices Research Laboratories, NEC Corporation
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Takaira Seiichi
Department Of Electrical And Electronic Engineering National Defense Academy
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Goto Toshio
Graduate School Of Engineering Nagoya University
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Ishii Kenichi
Nanoelectronics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Hashimoto Takeshi
Institute Of Fluid Science Tohoku University
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SAMUKAWA Seiji
CREST, Japan Science and Technology Agency
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Samukawa Seiji
Crest Japan Science And Technology Agency
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Oda Fumihiko
Fundamental Research Department, R&D Center, Lamp Company, Ushio Inc., 1194 Sazuchi, Bessho-cho, Himeji, Hyogo 671-0224, Japan
著作論文
- Ultrathin Oxynitride Films Formed by Using Pulse-Time-Modulated Nitrogen Beams
- Novel Stacked Nanodisk with Quantum Effect Fabricated by Defect-free Chlorine Neutral Beam Etching
- A New Silicon Quantum-Well Structure with Controlled Diameter and Thickness Fabricated with Ferritin Iron Core Mask and Chlorine Neutral Beam Etching
- Fabrication of Four-Terminal Fin Field-Effect Transistors with Asymmetric Gate-Oxide Thickness Using an Anisotropic Oxidation Process with a Neutral Beam
- Optimally Stable Electron Cyclotron Resonance Plasma Generation and Essential Points for Compact Plasma Source
- Multi-Coil System for Electron Cyclcotron Resonance Plasma Generation
- Uniform Electron Cyclotron Resonance Plasma Generation for Precise ULSI Patterning
- Dependence of Electron Cyclotron Resonance Plasma Characteristics on Introduced Microwave Conditions
- New Fabrication Technology of Fin Field Effect Transistors Using Neutral-Beam Etching
- Fabrication of a Vertical-Channel Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor Using a Neutral Beam Etching
- Low-Leakage-Current Ultra-thin SiO_2 Film by Low-Temperature Neutral Beam Oxidation
- Control of Electron Transport in Two-Dimensional Array of Si Nanodisks for Spiking Neuron Device
- Fabrication of Defect-Free Sub-10nm Si Nanocolumn for Quantum Effect Devices Using Cl Neutral Beam Process
- Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma
- Ion Current Density and Ion Energy Distributions at the Electron Cyclotron Resonance Position in the Electron Cyclotron Resonance Plasma
- Ion Energy Distributions at the Electron Cyclotron Resonance Position in Electron Cyclotron Resonance Plasma
- Optical Diagnostics of a Pulsed Inductively Coupled Nitrogen Plasma
- Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes
- Effects of CF_3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes
- Control of UV Radiation Damages for the High Sensitive CCD Image Sensor
- On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes
- High-Efficiency Low Energy Neutral Beam Generation Using Negative Ions in Pulsed Plasma
- High-Efficiency Neutral-Beam Generation by Combination of Inductively Coupled Plasma and Parallel Plate DC Bias : Nuclear Science, Plasmas, Electric Dischanges
- Growth of Preferentially Oriented Microcrystalline Silicon Film Using Pulse-Modulated Ultrahigh-Frequency Plasma
- Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO_2 Etching
- Surface Reaction Enhancement by UV irradiation during Si Etching Process with Chlorine Atom Beam
- Magnetically Damage-free Etching of MTJ Film for Future 0.24-μm-rule MRAMs