Low-Leakage-Current Ultra-thin SiO_2 Film by Low-Temperature Neutral Beam Oxidation

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• SAMUKAWA Seiji

  Institute of Fluid Science, Tohoku University

• ENDO Kazuhiko

  National Institute of Advanced Industrial Science and Technology

• Fukuda Seiichi

  Institute Of Fluid Science Tohoku University

• Samukawa Seiji

  Institute Of Fluid Science Tohoku University

• IKOMA Toru

  Institute of Fluid Science, Tohoku University

• TAGUCHI Chihiro

  Institute of Fluid Science, Tohoku University

• WATANABE Heiji

  Graduate School of Engineering, Osaka University

• Endo Kazuhiko

  National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn

• Taguchi Chihiro

  Institute Of Fluid Science Tohoku University

• Ikoma Toru

  Institute Of Fluid Science Tohoku University

• Watanabe Heiji

  Graduate School Of Engineering Osaka University

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