Magnetically Damage-free Etching of MTJ Film for Future 0.24-μm-rule MRAMs
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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Samukawa Seiji
Institute Of Fluid Science Tohoku University
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HADA Hiromitsu
System Devices Research Laboratories, NEC Corporation
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Hada Hiromitsu
System Devices Research Laboratories Nec Corporation
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Hada Hiromitsu
System Devices And Fundamental Research Nec Corporation
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Ohshima Norikazu
System Devices Research Laboratories Nec Corporation
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Mukai Tomonori
Institute Of Fluid Science Tohoku University
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MUKAI Tomonori
System Devices Research Laboratories, NEC Corporation
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