Ohshima Norikazu | System Devices Research Laboratories Nec Corporation
スポンサーリンク
概要
関連著者
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Hada Hiromitsu
System Devices And Fundamental Research Nec Corporation
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Ohshima Norikazu
System Devices Research Laboratories Nec Corporation
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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Samukawa Seiji
Institute Of Fluid Science Tohoku University
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HADA Hiromitsu
System Devices Research Laboratories, NEC Corporation
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Hada Hiromitsu
System Devices Research Laboratories Nec Corporation
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Tahara Shuichi
System Devices Research Laboratories Nec Corporation
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Mukai Tomonori
Institute Of Fluid Science Tohoku University
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MUKAI Tomonori
System Devices Research Laboratories, NEC Corporation
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Suemitsu Katsumi
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Amano Minoru
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Fukumoto Yoshiyuki
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Numata Hideaki
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Nagahara Kiyokazu
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Asao Yoshiaki
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Yoda Hiroaki
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Yoda Hiroaki
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Asao Yoshiaki
Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Hada Hiromitsu
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Tahara Shuichi
System Devices Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
著作論文
- Magnetically Damage-free Etching of MTJ Film for Future 0.24-μm-rule MRAMs
- Switching-Field Stabilization against Effects of High-Temperature Annealing in Magnetic Tunnel Junctions using Thermally Reliable NixFe100-x/Al-Oxide/Ta Free Layer