Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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Samukawa S
Tohoku Univ. Sendai Jpn
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Samukawa Seiji
Institute Of Fluid Science Tohoku University
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Samukawa Seiji
Process Development Department Vlsi Development Division Nec Corporation
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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ISHIKAWA Yasushi
Institute of Fluid Science, Tohoku University
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Kato Yuji
Institute Of Fluid Science Tohoku University
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Okigawa Mitsuru
Sanyo Electric Co. Ltd.
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ICHIHASHI Yoshinari
Institute of Fluid Science, Tohoku University
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SHIMIZU Ryu
Sanyo Electric Co., Ltd.
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Shimizu Ryu
Sanyo Electric Co. Ltd.
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Ishikawa Yasushi
Institute Of Fluid Science Tohoku University
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Ichihashi Yoshinari
Institute Of Fluid Science Tohoku University
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