Samukawa Seiji | Process Development Department Vlsi Development Division Nec Corporation
スポンサーリンク
概要
関連著者
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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Samukawa S
Tohoku Univ. Sendai Jpn
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Samukawa Seiji
Process Development Department Vlsi Development Division Nec Corporation
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Nakamura T
Hokkaido Univ. Sapporo Jpn
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SAMUKAWA Seiji
VLSI Development Division, NEC Corporation
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Samukawa Seiji
Institute Of Fluid Science Tohoku University
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ISHIKAWA Yasushi
Institute of Fluid Science, Tohoku University
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Nakamura Tetsuro
Department Of Electrical Engineering And Electronics Toyohashi University Of Technology
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Nakamura Toshihiko
Faculty Of Engineering Tokyo Institute Of Technology
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Okigawa Mitsuru
Sanyo Electric Co. Ltd.
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Ishitani A
O Ntt Atsugi R&d Center:(permanant Address)semiconductor Company Matsushita Electronics Corporat
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Ishikawa Yasushi
Institute Of Fluid Science Tohoku University
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NAKAMURA Tsuyoshi
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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Ishida Tadashi
National Institute Of Advanced Industrial Science And Technology
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Ishida Toshimasa
Research Laboratory Oki Electric Industry Co. Lid
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Ishida Takayuki
Department Of Radiology National Federation Of Health Insurance Societies Osaka Chuo Hospital
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Ishida T
Department Of Physics Faculty Of Science Ibaraki University
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Nakamura Tsuyoshi
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratory Nec Corporation
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深沢 塔一
金沢工業大学機械系
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ISHIDA Toshinori
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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ISHITANI Akihiko
VLSI Development Division, NEC Corporation
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中川 吉郎
大阪市立大学
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Ikeda K
Mitsubishi Electric Corp. Hyogo Jpn
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Ikeda Keisuke
Institute For Materials Research Tohoku University
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Nakagawa Y
Yamanashi Univ. Kofu Jpn
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Ikeda Keiji
Department Of Physical Electronics Tokyo Institute Of Technology
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中川 吉郎
大阪市立大・工
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Kato Yuji
Institute Of Fluid Science Tohoku University
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ICHIHASHI Yoshinari
Institute of Fluid Science, Tohoku University
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SHIMIZU Ryu
Sanyo Electric Co., Ltd.
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Shimizu Ryu
Sanyo Electric Co. Ltd.
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Ishitani Akihiko
Vlsi Development Division Nec Corporation
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Ichihashi Yoshinari
Institute Of Fluid Science Tohoku University
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堀 勝
名古屋大学大学院工学研究科電子情報システム専攻
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SAMUKAWA Seiji
Microelectronics Research Laboratories, NEC Corporation
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NAKAMURA Tsuyoshi
FA Development Laboratories, NEC Corporatton
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ISHIDA Toshinori
FA Development Laboratories, NEC Corporatton
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ISHITANI Akihiko
ULSI Device Development Laboratories, NEC Corporation
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SAMUKAWA Seiji
Process Development Department, VLSI Development Division, NEC Corporation
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ISHITANI Akihiko
Process Development Department, VLSI Development Division, NEC Corporation
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KAWASE Yutaka
Mechatronics Research Laboratry, Functional Devices Research Laboratories, NEC Corporation
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Goto T
Graduate School Of Pharmaceutical Sciences Tohoku University
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Goto Takaaki
Department Of Electric Engineering Tokyo University Of Agriculture And Technology
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Hori Masaru
Graduate School Of Engineering Nagoya University
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Hori Masaru
School Of Engineering Nagoya University
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Murata Kazuya
Graduate School Of Science Osaka City University
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SAMUKAWA Seiji
LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation
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NAKAGAWA Yukito
Anelva Corporation
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IKEDA Kei
ANELVA Corporation
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NAKAGAWA Yukito
ANEL VA Corporation
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IKEDA Kei
ANEL VA Corporation
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TADA Shigekazu
Department of Quantum Engineering, Nagoya University
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Kawase Yutaka
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Kumagai Shinya
Institute Of Fluid Science Tohoku University
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Tsukada T
Tdk Corp. Chiba Jpn
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Samukawa Seiji
Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation
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MIZUHARA Hideki
Sanyo Electric Co., Ltd.
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ISHIKAWA Yasushi
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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KATOH Yuji
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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OKIGAWA Mitsuru
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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SAMUKAWA Seiji
Intelligent Nano-Process laboratory, Institute of Fluid Science, Tohoku University
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MIZUTANI Yuko
Graduate School of Engineering, Nagoya University
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IWASAKA Emi
Graduate School of Engineering, Nagoya University
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TAKASHIMA Seigou
Graduate School of Engineering, Nagoya University
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GOTO Toshio
Graduate School of Engineering, Nagoya University
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TSUKADA Tsutomu
Semiconductor Equipment Division, Anelva Corporation
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Sakakibara T
Department Of Quantum Engineering Nagoya University
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後藤 俊夫
Imram Tohoku University
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Murata Kazuya
Graduate School Of Engineering Nagoya University
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Iwasaka Emi
Graduate School Of Engineering Nagoya University
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Mizutani Yuko
Graduate School Of Engineering Nagoya University
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Mizuhara Hideki
Sanyo Electric Co. Ltd.
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Ishitani Akihiko
Ulsi Device Development Laboratories Nec Corporation
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Samukawa Seiji
Microelectronics Research Laboratories Nec Corporation
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Goto Toshio
Graduate School Of Engineering Nagoya University
著作論文
- Optimally Stable Electron Cyclotron Resonance Plasma Generation and Essential Points for Compact Plasma Source
- Multi-Coil System for Electron Cyclcotron Resonance Plasma Generation
- Uniform Electron Cyclotron Resonance Plasma Generation for Precise ULSI Patterning
- Dependence of Electron Cyclotron Resonance Plasma Characteristics on Introduced Microwave Conditions
- Ion Current Density and Ion Energy Distributions at the Electron Cyclotron Resonance Position in the Electron Cyclotron Resonance Plasma
- Ion Energy Distributions at the Electron Cyclotron Resonance Position in Electron Cyclotron Resonance Plasma
- Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes
- Effects of CF_3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes
- Control of UV Radiation Damages for the High Sensitive CCD Image Sensor
- On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes
- Growth of Preferentially Oriented Microcrystalline Silicon Film Using Pulse-Modulated Ultrahigh-Frequency Plasma
- Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO_2 Etching