SAMUKAWA Seiji | LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation
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概要
- Samukawa Seijiの詳細を見る
- 同名の論文著者
- LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporationの論文著者
関連著者
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SAMUKAWA Seiji
LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation
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Samukawa Seiji
Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation
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NAKANO Toshiki
Department of Electrical and Electronic Engineering, National Defense Academy
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Nakano Toshiki
Department Of Electrical And Electronic Engineering National Defense Academy
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SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
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深沢 塔一
金沢工業大学機械系
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Samukawa S
Tohoku Univ. Sendai Jpn
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Samukawa Seiji
Process Development Department Vlsi Development Division Nec Corporation
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Samukawa S
Nec Corp. Ibaraki Jpn
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Sasaki Takahiko
Institute For Materials Research(imr) Tohoku University
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TAKAHASHI Nobuaki
Department of Applied Physics, National Defense Academy
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NAKAGAWA Yukito
Anelva Corporation
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TSUKADA Tsutomu
Anelva Corporation
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UEYAMA Hiroyuki
Nihon Koshuha Co., Ltd.
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SHINOHARA Kibatsu
Nihon Koshuha Co., Ltd.
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Takahashi Nobuaki
Tokyo Electron Limited.
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Sasaki T
Department Of Applied Physics National Defense Academy
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AKASHI Haruaki
Department of Applied Physics, National Defense Academy
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SASAKI Tai
Department of Applied Physics, National Defense Academy
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Ohtake Hiroto
Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation
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Akashi Haruaki
Department Of Applied Physics National Defense Academy
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Nakano Toshiki
Department Of Electrical Engineering National Defense Academy
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Nakano T
National Defense Acad. Kanagawa Jpn
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Tsukada Tsutomu
Anelva Corp.
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Takahashi N
Department Of Materials Science And Engineering & Frontier Research Center Graduate School Of En
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Tsuda Ken-ichiro
Fundamental Research Laboratories Nec Corporation
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Samukawa Seiji
Lsi Basic Research Laboratory Silicon Systems Research Laboratories Nec Corporation
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Sasaki Tsutomu
Advanced Technology Research Laboratories Nippon Steel Corporation
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Ueyama Hiroyuki
Nihon Koshuha Co. Ltd.
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Shinohara Kibatsu
Nihon Koshuha Co. Ltd.
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Takahashi Nobuaki
Department Of Applied Physics National Defense Academy
著作論文
- New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes
- Dependence of Frequency and Pressure on Electron Energy Distribution Functionsin Low Pressure Plasma
- Ion and Neutral Temperatures in a Novel Ultrahigh-Frequency Discharge Plasma
- Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO_2 Etching
- New Radical-Control Method for SiO_2 Etching with Non-Perfluorocompound Gas Chemistries
- Doppler-Shifted Laser-Induced Fluorescence Diagnostics of an Ultrahigh-Frequency Discharge Plasma
- Highly Selective and Highly Anisotropic SiO_2 Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma