Ion and Neutral Temperatures in a Novel Ultrahigh-Frequency Discharge Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-03-01

著者

• SAMUKAWA Seiji

  LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation

• Ohtake Hiroto

  Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation

• NAKANO Toshiki

  Department of Electrical and Electronic Engineering, National Defense Academy

• Samukawa Seiji

  Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation

• Nakano Toshiki

  Department Of Electrical And Electronic Engineering National Defense Academy

• Nakano Toshiki

  Department Of Electrical Engineering National Defense Academy

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• Dependence of Frequency and Pressure on Electron Energy Distribution Functionsin Low Pressure Plasma
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• Nitrogen Atom Densities in Rare Gas Diluted N_2 Plasmas with Capacitive and Inductive Coupling
• Ion and Neutral Temperatures in a Novel Ultrahigh-Frequency Discharge Plasma
• Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO_2 Etching
• Effect of Carrier Gas on Structure of Plasma Polymerized Tetrafluoroethylene Films
• New Radical-Control Method for SiO_2 Etching with Non-Perfluorocompound Gas Chemistries
• Doppler-Shifted Laser-Induced Fluorescence Diagnostics of an Ultrahigh-Frequency Discharge Plasma
• Dielectric Properties of Plasma-Polymerized Tetrafluoroethylene Films : Chemistry : incl. physical process
• Plasma-Polymerized Films as Orientating Layers for Liquid Crystals
• Helicon wave excited plasmas
• Highly Selective and Highly Anisotropic SiO_2 Etching in Pulse-Time Modulated Electron Cyclotron Resonance Plasma
• Recent Topics on Electrical Discharge Technologies
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• The Correlation between an Electric Field and the Metastable Chlorine Ion Density Distributions in an Ultrahigh-Frequency Plasma
• Monitoring of CF and CF2 Number Density by Optical Emission Intensity Corrected using Probe-Measured Plasma Parameters
• Recent Topics on Electrical Discharge Technologies
• Doppler-Shifted Laser-Induced Fluorescence Diagnostics of an Ultrahigh-Frequency Discharge Plasma

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