Effect of Carrier Gas on Structure of Plasma Polymerized Tetrafluoroethylene Films
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概要
- 論文の詳細を見る
Thin films were polymerized by introducing tetrafluoroethylene gas into the "tail-flame" of a glow discharge of hydrogen or argon used as a carrier gas. Compared with argon, hydrogen gives a higher deposition rate at low discharge power and a lower rate at high discharge power. ESR, ESCA and IR measurements showed that films polymerized using hydrogen as a carrier gas are crosslinked to a higher degree and have more radicals than those polymerized using argon. The former films have higher tan δ values than the latter films. These results arise from the competing processes of polymerization and ablation in the glow-discharge plasma.
- 社団法人応用物理学会の論文
- 1985-01-20
著者
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OHKI Yoshimichi
Department of Electrical Engineering, School of Science and Engineering, Waseda University
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YAHAGI Kichinosuke
Department of Electrical Engineering, School of Science and Engineering, Waseda University
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NAKANO Toshiki
Department of Electrical and Electronic Engineering, National Defense Academy
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Nakano Toshiki
Department Of Electrical And Electronic Engineering National Defense Academy
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Nakano Toshiki
Department Of Electrical Engineering School Of Science And Engineering Waseda University
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Ohki Yoshimichi
Department Of Electrical Electronic And Computer Engineering Waseda University
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KASAMA Yasuhiro
Department of Electrical Engineering, School of Science and Engineering, Waseda University
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Yahagi Kichinosuke
Department Of Electrical Engineering School Of Science And Engineering Waseda University
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Kasama Y
Department Of Electrical Engineering School Of Science And Engineering Waseda University
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Kasama Yasuhiro
Department Of Electrical Engineering Waseda University
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