Rare Gas Metastable Atom Density in Diluted O_2 RF Plasmas
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概要
- 論文の詳細を見る
Rare gas diluted O2 plasmas are gaining interests for application to high quality SiO2 film formation. The density of rare gas metastable atoms and O atom in rare gas diluted O2 radio frequency (RF) capacitively coupled plasma (CCP) was measured by optical absorption spectroscopy (OAS). Decreases of rare gas metastable densities due to addition of O2 indicate efficient O atom production by rare gas metastables via collisional quenching. Krypton metastable had highest density among four rare gas species for fixed RF power. The decrease of Ar metastable density due to O2 addition showed quantitative agreement with reported quenching rate coefficient. Detailed discussion on different gas pressures illustrates reduced O2 fraction is the key for selective production of O atoms through rare gas metastables.
- 社団法人 電気学会の論文
- 2006-01-01
著者
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TAKAHASHI Kei
Department of Food Science and Nutrition, School of Human Cultures, The University of Shiga Prefectu
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MAKABE Toshiaki
Department of Electrical Engineering, Keio University
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Makabe Toshiaki
Department Of Electronics And Electrical Engineering Keio University
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Makabe Toshiaki
Department Of Electrical Engineering Faculty Of Science And Technology Keio University
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KITAJIMA Takeshi
Department of Electrical Engineering, Faculty of Science and Technology, Keio University
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Kitajima Takeshi
Department Of Electrical And Electronic Engineering National Defense Academy
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NAKANO Toshiki
Department of Electrical and Electronic Engineering, National Defense Academy
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Nakano Toshiki
Dep. Of Electrical And Electronic Engineering National Defense Acad.
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Nakano Toshiki
Department Of Electrical And Electronic Engineering National Defense Academy
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Takahashi Kei
Department Of Electrical And Electronic Engineering National Defense Academy
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Takahashi Kei
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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