Monitoring of CF and CF2 Number Density by Optical Emission Intensity Corrected using Probe-Measured Plasma Parameters
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概要
- 論文の詳細を見る
The use of the CF and CF2 optical emission (OE) intensity corrected by the probe-measured electron density and temperature is proposed for the estimation of CF and CF2 relative number density in low-pressure, high-density fluorocarbon plasmas. The estimation of the CF and CF2 density by the corrected OE is mainly based on an assumption that the electron energy distribution function near the threshold energy of these OE is approximated by a Maxwellian using the probe-measured electron temperature. The comparison of the corrected OE intensity with CF and CF2 laser-induced fluorescence (LIF) intensity, which represents the CF and CF2 number density, confirms good proportionality between the LIF and the corrected OE intensity. Thus, the proposed procedure is expected to be useful for the monitoring of CF and CF2 radicals.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-02-15
著者
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Nakano Toshiki
Department Of Electrical And Electronic Engineering National Defense Academy
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Nakano Toshiki
Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
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Yanagita Katsushi
Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
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