Photoluminescence Analysis of plasma-deposited Oxygen-rich Silicon oxynitride Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-15
著者
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Watanabe Takashi
Department of Chemistry, Graduate School of Science, Kyoto University
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Kato H
Photon Factory High Energy Accelerator Research Organization
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Kato Hiroo
Institute Of Material Structure Science High Energy Accelerator Research Organization
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Kato H
Saitama University
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Kato Hiromichi
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Kato Hisayuki
Semiconductor Design & Development Center Hitachi Ltd.
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OHKI Yoshimichi
Department of Electrical Engineering, School of Science and Engineering, Waseda University
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Kato H
Institute For Materials Research Tohoku University
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Kato H
Department Of Mechanical And Intelligent Engineering Graduate School Of Engineering Utsunomiya Unive
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Kato Hiromitsu
Department Of Electrical Engineering And Bioscience Waseda University
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NOMA Takashi
Engineering Department 1, MOS-LSI Division, Semiconductor Company, Sanyo Electric Co., Ltd.
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SEOL Kwang
RIKEN(The Institute of Physical and Chemical Research)
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FUJIMAKI Makoto
Optical Radiation Section, Electrotechnical Laboratory
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Seol Kwang
Riken
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Noma Takashi
Engineering Department 1 Mos-lsi Division Semiconductor Company Sanyo Electric Co. Ltd.:advanced Res
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Seol K
Riken Saitama Jpn
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Ohki Yoshimichi
Department Of Electrical Electronics And Computer Engineering Waseda University
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Ohki Yoshimichi
Department Of Electrical Electronic And Computer Engineering Waseda University
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Fujimaki M
Optical Radiation Section Electrotechnical Laboratory
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Kato Hiroki
Ceramic Engineering Research Laboratory, Nagoya Institute of Technology
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Watanabe Takashi
Department Of Cardiothoracic Surgery Nagoya University School Of Medicine
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Watanabe Takashi
Department Of Electrical Electronics And Computer Engineering Waseda University
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Watanabe Takashi
Department Of Applied Physics Tohoku University
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OHKI Yoshimichi
Department of Electrical, Electronics, and Computer Engineering, Waseda University
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