Ueyama Hiroyuki | Nihon Koshuha Co. Ltd.
スポンサーリンク
概要
関連著者
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UEYAMA Hiroyuki
Nihon Koshuha Co., Ltd.
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Ueyama Hiroyuki
Nihon Koshuha Co. Ltd.
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SHIRAI Hajime
Department of Functional Materials Science, Faculty of Engineering
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Shirai Hajime
Department Of Functional Materials And Science Faculty Of Engineering Saitama University
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Ueyama H
Nihon Koshuha Co. Ltd.
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Yoshino Koichi
Department of Epidemiology and Public Health, Tokyo Dental College
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Yoshino Koichi
Department Of Epidemiology And Public Health Tokyo Dental College
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OHKAWARA Go
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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SAKUMA Yoshikazu
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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Ohkawara Go
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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Sakuma Yoshikazu
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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深沢 塔一
金沢工業大学機械系
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Arai Takeshi
Faculty Of Pharmaceutical Sciences Josai University
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SAMUKAWA Seiji
LSI Basic Research Laboratory, Microelectronics Research Laboratories, NEC Corporation
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NAKAGAWA Yukito
Anelva Corporation
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TSUKADA Tsutomu
Anelva Corporation
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SHINOHARA Kibatsu
Nihon Koshuha Co., Ltd.
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Shirai Hajime
Faculty Of Engineering Saitama University
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Samukawa Seiji
Lsi Basic Research Laboratory Microelectronics Research Laboratories Nec Corporation
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FUKAI Chisato
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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Tsukada Tsutomu
Anelva Corp.
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MORIYA Yoshimizu
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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Fukai C
Saitama Univ. Saitama Jpn
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Fukai Chisato
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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Moriya Yoshinori
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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Shinohara Kibatsu
Nihon Koshuha Co. Ltd.
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Yoshino Katsumi
The Department Of Electrical Engineering Osaka University
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Arai Takeshi
Faculty Of Engineering Saitama University
著作論文
- New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes
- Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH_4-and-D_2 Mixture
- Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges
- Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth
- Fast Deposition of Microcrystalline Silicon Using High-Density SiH_4 Microwave Plasma
- The Generation of High-Density Microwave Plasma and Its Application to Large-Area Microcrystalline Silicon Thin Film Formation