Shirai Hajime | Department Of Functional Materials And Science Faculty Of Engineering Saitama University

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著作論文

Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture
Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition : Surfaces, Interfaces, and Films
Low-Temperature Plasma-Enhanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane
Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2 and SiCl4
Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl_4 and H_2 Mixture : Optical Properties of Condensed Matter
Formation of Self-Assembled Nanocrystalline Silicon Dots SiC14/H2 RF Plasma-Enhanced Chemical Vapor Deposition : Semiconductors
Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH_4-and-D_2 Mixture
Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges
Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth
Fast Deposition of Microcrystalline Silicon Using High-Density SiH_4 Microwave Plasma
Carbon Microstructures Synthesized Utilizing the RF Microplasma Jet at Atmospheric Pressure
Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma
Efficient organic photovoltaic cells using hole-transporting MoO3 buffer layers converted from solution-processed MoS2 films
Enhanced Crystallinity at Initial Growth Stage of Microcrystalline Silicon on Corning #7059 Glass Using SiH_2Cl_2
Improved Power Conversion Efficiency of Organic Photovoltaic Cell Fabricated by Electrospray Deposition Method by Mixing Different Solvents (Special Issue : Solid State Devices and Materials (1))
Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure
Synthesis of Well-Aligned Carbon Nanotubes Using a High-Density RF Inductive Coupling Plasma
Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH2Cl2 and SiCl4 for Window Layer of Thin Film Si Solar Cell
Formation of Si:H:Cl Films at Low Temperatures of 90–140°C by RF Plasma-Enhanced Chemical Vapor Deposition of a SiH2Cl2 and H2 Mixture
Plasma Parameters for Fast Deposition of Highly Crystallized Microcrystalline Silicon Films Using High-Density Microwave Plasma
Photoluminescence and Optical Characterizations of Nanocrystalline Silicon Dots Formed by Plasma-Enhanced Chemical Vapor Deposition
Increased Organic Photovoltaic Cell Efficiency by Incorporating a Nonionic Fluorinated Surfactant Cathode Interlayer

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