Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges

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概要

• 論文の詳細を見る

• Novel high-density and low-temperature microwave plasma utilizing an internal spoke antenna is demonstrated. No quartz glass plate is required to maintain a high-density plasma using the alumina-ceramic-coated spoke antenna. Consequently, the plasma source is fairly simple. This microwave plasma maintains the uniform state over a diameter of 22 cm with a high electron density of 10^<11> cm^<-3> and a low temperature of 1-3 eV as well as a higher traveling efficiency of the microwave power to the chamber than that of the external one. A fast deposition rate of 〜 40 Å/s is achieved for highly crystallized microcrystalline silicon (μc-Si:H) formation from SiH_4 and H_2 under lower-power-supply conditions. This high-density microwave plasma utilizing an internal spoke antenna has a high potential for larger-area thin film processing.

• 社団法人応用物理学会の論文
• 2001-07-01

著者

• SHIRAI Hajime

  Department of Functional Materials Science, Faculty of Engineering

• UEYAMA Hiroyuki

  Nihon Koshuha Co., Ltd.

• Shirai Hajime

  Department Of Functional Materials And Science Faculty Of Engineering Saitama University

• Ueyama H

  Nihon Koshuha Co. Ltd.

• Yoshino Koichi

  Department of Epidemiology and Public Health, Tokyo Dental College

• Yoshino Koichi

  Department Of Epidemiology And Public Health Tokyo Dental College

• OHKAWARA Go

  Department of Functional Materials Science, Faculty of Engineering, Saitama University

• Ohkawara Go

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Ueyama Hiroyuki

  Nihon Koshuha Co. Ltd.

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