Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH2Cl2 and SiCl4 for Window Layer of Thin Film Si Solar Cell
スポンサーリンク
概要
- 論文の詳細を見る
A novel p-type hydrogenated chlorinated nanocrystalline silicon (nc-Si:H:(Cl)) film was fabricated from chlorinated materials, i.e., SiH2Cl2 and SiCl4,by rf plasma-enhanced chemical vapor deposition. These p-type nc-Si:H:(Cl) films showed high conductivities of 10–50 S/cm under 3000–5000 ppm B2H6-mixing concentrations with lower optical absorption in the visible region, while maintaining a high film crystallinity. No marked darkening of the ZnO:Al layer was observed after deposition of the p-type nc-Si:H:(Cl) layer fabricated from SiH2Cl2 and SiCl4 compared to the p-type Si:H film fabricated from SiH4. The origin of the low optical absorption in p-type nc-Si:H:(Cl) is demonstrated along with the performance of a p–i–n structure amorphous silicon solar cell.
- 2004-09-15
著者
-
Li Yali
Department Of Functional Materials Science Faculty Of Engineering
-
YAMAZAKI Michiaki
Department of Functional Materials Science, Faculty of Engineering
-
HASEGAWA Yasuhiro
Graduate School of Science and Technology, Saitama University
-
Ito Tetsuji
Department Of Functional Materials Science Faculty Of Engineering
-
Ikeda Yoshie
Department Of Functional Materials Science Faculty Of Engineering
-
Shirai Hajime
Department Of Functional Materials And Science Faculty Of Engineering Saitama University
-
Yamazaki Michiaki
Department of Functional Materials Science, Faculty of Engineering, 255 Shimo-Okubo, Sakura, Saitama 338-8570, Japan
-
Li Yali
Department of Functional Materials Science, Faculty of Engineering, 255 Shimo-Okubo, Sakura, Saitama 338-8570, Japan
-
Ito Tetsuji
Department of Functional Materials Science, Faculty of Engineering, 255 Shimo-Okubo, Sakura, Saitama 338-8570, Japan
-
Shirai Hajime
Department of Functional Materials Science, Faculty of Engineering, 255 Shimo-Okubo, Sakura, Saitama 338-8570, Japan
-
Hasegawa Yasuhiro
Graduate School of Science and Engineering, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama 338-8570, Japan
関連論文
- Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH_2Cl_2 and SiCl_4 for Window Layer of Thin Film Si Solar Cell
- Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture
- A NOVEL GENE ETT-1 CAUSING EXPERIMENTAL TESTICULAR TERATOMAS LOCATED ON MOUSE CHROMOSOME 18(Developmental Biology,Abstracts of papers presented at the 74^ Annual Meeting of the Zoological Society of Japan)
- Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition : Surfaces, Interfaces, and Films
- Low-Temperature Plasma-Enhanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane
- Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2 and SiCl4
- Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl_4 and H_2 Mixture : Optical Properties of Condensed Matter
- Formation of Self-Assembled Nanocrystalline Silicon Dots SiC14/H2 RF Plasma-Enhanced Chemical Vapor Deposition : Semiconductors
- Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH_4-and-D_2 Mixture
- Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges
- Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth
- Fast Deposition of Microcrystalline Silicon Using High-Density SiH_4 Microwave Plasma
- Carbon Microstructures Synthesized Utilizing the RF Microplasma Jet at Atmospheric Pressure
- Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma
- Efficient organic photovoltaic cells using hole-transporting MoO3 buffer layers converted from solution-processed MoS2 films
- Enhanced Crystallinity at Initial Growth Stage of Microcrystalline Silicon on Corning #7059 Glass Using SiH_2Cl_2
- Improved Power Conversion Efficiency of Organic Photovoltaic Cell Fabricated by Electrospray Deposition Method by Mixing Different Solvents (Special Issue : Solid State Devices and Materials (1))
- Evaluation of Thermoelectric Properties in Bi-Microwires by the Harman Method
- Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure
- Synthesis of Well-Aligned Carbon Nanotubes Using a High-Density RF Inductive Coupling Plasma
- Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH2Cl2 and SiCl4 for Window Layer of Thin Film Si Solar Cell
- Numerical Calculation of Magneto-Seebeck Coefficient of Bismuth under a Magnetic Field
- Formation of Si:H:Cl Films at Low Temperatures of 90–140°C by RF Plasma-Enhanced Chemical Vapor Deposition of a SiH2Cl2 and H2 Mixture
- Plasma Parameters for Fast Deposition of Highly Crystallized Microcrystalline Silicon Films Using High-Density Microwave Plasma
- Photoluminescence and Optical Characterizations of Nanocrystalline Silicon Dots Formed by Plasma-Enhanced Chemical Vapor Deposition
- Increased Organic Photovoltaic Cell Efficiency by Incorporating a Nonionic Fluorinated Surfactant Cathode Interlayer