Enhanced Crystallinity at Initial Growth Stage of Microcrystalline Silicon on Corning #7059 Glass Using SiH_2Cl_2

スポンサーリンク

概要

• 論文の詳細を見る

• The crystallinity at the initial growth stage of hydrogenated microcrystalline silicon (μc-Si:H) was greatly improved on Corning #7059 glass substrate with dichlorosilane (SiH_2Cl_2) as the starting gas using conventional (13.56 MHz) capacitively coupled plasma-enhanced chemical vapor deposition system. Deposition studies examined film thickness, substrate temperature, total pressure, electrode distance and H_2-dilution conditions as variables. Through Raman spectroscopy, atomic force microscopy (AFM), spectroscopic ellipsometry, X-ray diffraction (XRD) and Mie scattering measurements, it was found that 〜20 nm sized crystalline Si particles were formed in the plasma region, resulting in the enhanced crystallization from the initial growth stage. The growth kinetics of μc-Si:H from SiH_2Cl_2, compared with that from SiH_4, is described.

• 社団法人応用物理学会の論文
• 1999-05-15

著者

• Shirai Hajime

  Department Of Functional Materials And Science Faculty Of Engineering Saitama University

• FUKAI Chisato

  Department of Functional Materials Science, Faculty of Engineering, Saitama University

• MORIYA Yoshimizu

  Department of Functional Materials Science, Faculty of Engineering, Saitama University

• Fukai C

  Saitama Univ. Saitama Jpn

• Fukai Chisato

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Moriya Yoshinori

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Nakamura Takuya

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Nakamura Takuya

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University

関連論文

• Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture
• Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition : Surfaces, Interfaces, and Films
• Low-Temperature Plasma-Enhanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane
• Axially Controlled Solid-Phase Crystallization of Amorphous Silicon
• Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2 and SiCl4
• Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl_4 and H_2 Mixture : Optical Properties of Condensed Matter
• Formation of Self-Assembled Nanocrystalline Silicon Dots SiC14/H2 RF Plasma-Enhanced Chemical Vapor Deposition : Semiconductors
• Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH_4-and-D_2 Mixture
• Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges
• Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth
• Fast Deposition of Microcrystalline Silicon Using High-Density SiH_4 Microwave Plasma
• Carbon Microstructures Synthesized Utilizing the RF Microplasma Jet at Atmospheric Pressure
• Molecular Beam Epitaxy of SrTiO_3 Films on Si(100)-2 × 1 with SrO Buffer Layer
• Effects of Chamber Wall Heating and Quartz Window on Fast Deposition of Microcrystalline Silicon Films by High-Density Microwave Plasma
• Efficient organic photovoltaic cells using hole-transporting MoO3 buffer layers converted from solution-processed MoS2 films
• Enhanced Crystallinity at Initial Growth Stage of Microcrystalline Silicon on Corning #7059 Glass Using SiH_2Cl_2
• Atmospheric Effect on Wettirng of (Pb, La)(Zr, Ti)O_3 with Electrode Metals
• Improved Power Conversion Efficiency of Organic Photovoltaic Cell Fabricated by Electrospray Deposition Method by Mixing Different Solvents (Special Issue : Solid State Devices and Materials (1))
• Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure
• Synthesis of Well-Aligned Carbon Nanotubes Using a High-Density RF Inductive Coupling Plasma
• Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH2Cl2 and SiCl4 for Window Layer of Thin Film Si Solar Cell
• Formation of Si:H:Cl Films at Low Temperatures of 90–140°C by RF Plasma-Enhanced Chemical Vapor Deposition of a SiH2Cl2 and H2 Mixture
• Plasma Parameters for Fast Deposition of Highly Crystallized Microcrystalline Silicon Films Using High-Density Microwave Plasma
• Photoluminescence and Optical Characterizations of Nanocrystalline Silicon Dots Formed by Plasma-Enhanced Chemical Vapor Deposition
• Molecular Beam Epitaxy of SrTiO3 Films on Si(100)-2×1 with SrO Buffer Layer
• Increased Organic Photovoltaic Cell Efficiency by Incorporating a Nonionic Fluorinated Surfactant Cathode Interlayer

もっと見る 閉じる

スポンサーリンク