Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH_2Cl_2 and SiCl_4 for Window Layer of Thin Film Si Solar Cell

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-09-15

著者

• Li Yali

  Department Of Functional Materials Science Faculty Of Engineering

• IKEDA Yoshie

  Department of Functional Materials Science, Faculty of Engineering

• ITO Tetsuji

  Department of Functional Materials Science, Faculty of Engineering

• YAMAZAKI Michiaki

  Department of Functional Materials Science, Faculty of Engineering

• HASEGAWA Yasuhiro

  Graduate School of Science and Technology, Saitama University

• SHIRAI Hajime

  Department of Functional Materials Science, Faculty of Engineering

関連論文

• Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH_2Cl_2 and SiCl_4 for Window Layer of Thin Film Si Solar Cell
• Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture
• A NOVEL GENE ETT-1 CAUSING EXPERIMENTAL TESTICULAR TERATOMAS LOCATED ON MOUSE CHROMOSOME 18(Developmental Biology,Abstracts of papers presented at the 74^ Annual Meeting of the Zoological Society of Japan)
• Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition : Surfaces, Interfaces, and Films
• Low-Temperature Plasma-Enhanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane
• Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2 and SiCl4
• Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl_4 and H_2 Mixture : Optical Properties of Condensed Matter
• Formation of Self-Assembled Nanocrystalline Silicon Dots SiC14/H2 RF Plasma-Enhanced Chemical Vapor Deposition : Semiconductors
• Microcrystalline Silicon Film Growth Using a High-Density Microwave Plasma of SiH_4-and-D_2 Mixture
• Novel High Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films : Nuclear Science, Plasmas, Electric Dischanges
• Spatial Distribution of the High-Density Microwave Plasma and Its Effect on Crystal Silicon Film Growth
• Fast Deposition of Microcrystalline Silicon Using High-Density SiH_4 Microwave Plasma
• Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH2Cl2 and SiCl4 for Window Layer of Thin Film Si Solar Cell
• Numerical Calculation of Magneto-Seebeck Coefficient of Bismuth under a Magnetic Field

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