Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2003-10-01

著者

• 白井 肇

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Kurosaki Ken-ichi

  Department of Pediatrics, National Cardiovascular Center

• Kurosaki Ken-ichi

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Seri Yasuhiro

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• SHIRAI Hajime

  Department of Functional Materials Science, Faculty of Engineering

• JIA Haijun

  Department of Functional Materials Science, Faculty of Engineering, Saitama University

• Jia Haijun

  Department Of Functional Materials Science Faculty Of Engineering Saitama University

• Shirai Hajime

  Department Of Functional Materials And Science Faculty Of Engineering Saitama University

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• Synthesis of Novel P-Type Nanocrystalline Si Prepared from SiH_2Cl_2 and SiCl_4 for Window Layer of Thin Film Si Solar Cell
• Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2 Mixture
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• Surface Chemistry of Si:H:Cl Film Formation by RF Plasma-Enhanced Chemical Vapor Deposition of SiH2Cl2 and SiCl4
• Photoluminesence Properties of Nanocrystalline Si Dots Fabricated by RF Plasma-Enhanced Chemical Vapor Deposition of SiCl_4 and H_2 Mixture : Optical Properties of Condensed Matter
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• Efficient organic photovoltaic cells using hole-transporting MoO3 buffer layers converted from solution-processed MoS2 films
• Enhanced Crystallinity at Initial Growth Stage of Microcrystalline Silicon on Corning #7059 Glass Using SiH_2Cl_2
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• Photoluminescence and Optical Characterizations of Nanocrystalline Silicon Dots Formed by Plasma-Enhanced Chemical Vapor Deposition
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