Growth of Crystal Silicon Films from Chlorinated Silanes by RF Plasma-Enhanced Chemical Vapor Deposition : Surfaces, Interfaces, and Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-03-01
著者
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Fujimura Yukihiro
Department of Materials Science and Engineering, Nagoya Institute of Technology
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SHIRAI Hajime
Department of Functional Materials Science, Faculty of Engineering
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Fujimura Yukihiro
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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TOYOSHIMA Yasutake
Electrotechnical Laboratory
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Toyoshima Yasutake
Electrotechnical Labotatory
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Toyoshima Yoshiaki
Semiconductor Device Engineering Laboratory Toshiba Corporation
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Shirai Hajime
Department Of Functional Materials And Science Faculty Of Engineering Saitama University
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LIU Haiping
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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JUNG Sughoan
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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Jung S
Department Of Functional Materials Science Faculty Of Engineering Saitama University
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Liu H
Univ. Tokushima Tokushima Jpn
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Fujimura Yukihiro
Department Of Electronic Engineering Graduate School Of Engineering Gunma University
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Fujimura Y
Department Of Functional Materials And Science Faculty Of Engineering Saitama University
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Liu Haping
Department of Functional Materials Science, Faculty of Engineering, Saitama University
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Fujimura Yukihiro
Department of Functional Materials and Science, Faculty of Engineering, Saitama University
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