Effects of CF_3I Plasma for Reducing UV Irradiation Damage in Dielectric Film Etching Processes

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• SAMUKAWA Seiji

  Institute of Fluid Science, Tohoku University

• Samukawa S

  Tohoku Univ. Sendai Jpn

• Samukawa Seiji

  Institute Of Fluid Science Tohoku University

• Samukawa Seiji

  Process Development Department Vlsi Development Division Nec Corporation

• Samukawa Seiji

  Vlsi Development Div. Nec Corporation

• ISHIKAWA Yasushi

  Institute of Fluid Science, Tohoku University

• Okigawa Mitsuru

  Sanyo Electric Co. Ltd.

• ICHIHASHI Yoshinari

  Institute of Fluid Science, Tohoku University

• SHIMIZU Ryu

  Sanyo Electric Co., Ltd.

• MIZUHARA Hideki

  Sanyo Electric Co., Ltd.

• Shimizu Ryu

  Sanyo Electric Co. Ltd.

• Mizuhara Hideki

  Sanyo Electric Co. Ltd.

• Ishikawa Yasushi

  Institute Of Fluid Science Tohoku University

• Ichihashi Yoshinari

  Institute Of Fluid Science Tohoku University

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