High-Efficiency Neutral-Beam Generation by Combination of Inductively Coupled Plasma and Parallel Plate DC Bias : Nuclear Science, Plasmas, Electric Dischanges

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概要

• 論文の詳細を見る

• To avoid several kinds of radiation damage caused by charge build-up and by ultraviolet and X-ray photons during etching processes, we have developed a high-performance, neutral-beam etching system. The neutral-beam source consists of an inductively coupled plasma (ICP) source and top and bottom carbon parallel plates. The bottom carbon plate includes numerous apertures for extracting neutral beams from the plasma. By supplying a direct current (DC) bias to the top plate, the generated ions are accelerated towards the bottom plate. Most of them are efficiently converted into neutral atoms, either by neutralization in charge-transfer collisions with gas molecules during the ion transport and with aperture sidewalls in the bottom plate, or by recombination with low-energy electrons near the end of the bottom plate. When the aperture diameter and aperture length were 1mm and 10mm, respectively, the neutralization efficiency was almost 100% and the neutral flux density was equivalent to 1.2-2.8mA/cm^2. A neutral beam could thus be produced efficiently from the ICP source and the apertures in the bottom plate.

• 社団法人応用物理学会の論文
• 2001-07-15

著者

• SAMUKAWA Seiji

  Institute of Fluid Science, Tohoku University

• Samukawa Seiji

  Institute Of Fluid Science Tohoku University

• Samukawa Seiji

  Vlsi Development Div. Nec Corporation

• ICHIKI Katsunori

  Ebara Research Co., Ltd.

• SAKAMOTO Keisuke

  Institute of Fluid Science, Tohoku University

• Ichiki Katsunori

  Ebara Research Co. Ltd.

• Sakamoto Keisuke

  Institute Of Fluid Science Tohoku University

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