Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles
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概要
- 論文の詳細を見る
Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. When an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.
- 社団法人応用物理学会の論文
- 1991-11-30
著者
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratory Nec Corporation
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