Dependence of Electron Cyclotron Resonance plasma Characteristics on Magnetic Field Profiles : Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratory Nec Corporation
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- Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles
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