Dependence of Electron Cyclotron Resonance Plasma Characteristics on Magnetic Field Profiles
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概要
- 論文の詳細を見る
Ion energy distribution is influenced by the magnetic field profiles in electron cyclotron resonance (ECR) plasma. When a 875 G equi-magnetic field is nonuniform, the microwave absorption concentrates at the ECR position which is located near the microwave window. Then, the mean ion energy distribution on the substrate holder becomes much broader due to the ion acceleration by the plasma potential difference. In addition, the ion energy distribution depends on the uniformity of the magnetic field gradient at the ECR position. The microwave is absorbed efficiently around the small gradient ECR position. Therefore, a uniform magnetic field gradient at the ECR position causes a uniform and sharp ion energy distribution.
- 社団法人応用物理学会の論文
- 1991-07-15
著者
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Samukawa Seiji
Vlsi Development Div. Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratry Functional Devices Research Laboratories Nec Corporation
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Nakamura Tsuyoshi
Mechatronics Research Laboratory Nec Corporation
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