Ultrathin Oxynitride Films Formed by Using Pulse-Time-Modulated Nitrogen Beams

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2003-07-15

著者

• 寒川 誠二

  東北大学 流体科学研究所 知的ナノプロセス研究分野

• SAMUKAWA Seiji

  Institute of Fluid Science, Tohoku University

• MINEMURA Youichi

  Institute of Fluid Science, Tohoku University

• FUKUDA Seiichi

  Semiconductor Netwark Company, Sony Corporation

• Fukuda Seiichi

  Semiconductor Netwark Company Sony Corporation

• Samukawa Seiji

  Institute Of Fluid Science Tohoku University

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