WATANABE Heiji | Graduate School of Engineering, Osaka University
スポンサーリンク
概要
関連著者
-
WATANABE Heiji
Graduate School of Engineering, Osaka University
-
Watanabe Heiji
Graduate School Of Engineering Osaka University
-
Yasutake Kiyoshi
Graduate School Of Engineering Osaka University
-
SHIMURA Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
-
Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
SHIMURA Takayoshi
Graduate School of Engineering, Osaka University
-
Yasutake K
Graduate School Of Engineering Osaka University
-
Shimura Takayoshi
Graduate School Of Engineering Osaka University
-
Shimura Takayoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
YASUTAKE Kiyoshi
Graduate School of Engineering, Osaka University
-
SAMUKAWA Seiji
Institute of Fluid Science, Tohoku University
-
Shiraishi Kenji
Graduate School of Pure and Applied Science, University of Tsukuba
-
Nakajima Kaoru
Dep. Of Micro Engineering Kyoto Univ.
-
Umezawa Naoto
National Inst. For Materials Sci. Ibaraki Jpn
-
ENDO Kazuhiko
National Institute of Advanced Industrial Science and Technology
-
NARA Yasuo
Semiconductor Leading Edge Technologies, Inc.
-
Fukuda Seiichi
Institute Of Fluid Science Tohoku University
-
Samukawa Seiji
Institute Of Fluid Science Tohoku University
-
IKOMA Toru
Institute of Fluid Science, Tohoku University
-
TAGUCHI Chihiro
Institute of Fluid Science, Tohoku University
-
IWAMOTO Hayato
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
-
KADOMURA Shingo
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
-
AKASAKA Yasushi
Semiconductor Leading Edge Technologies Inc.
-
OOTSUKA Fumio
Semiconductor Leading Edge Technologies Inc.
-
Hosoi Takuji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
-
Endo Kazuhiko
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
-
Taguchi Chihiro
Institute Of Fluid Science Tohoku University
-
NAKAMURA Genji
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
UMEZAWA Naoto
Advanced Electronic Materials Center, National Institute for Materials Science
-
YAMABE Kikuo
Graduate School of Pure and Applied Sciences, University of Tsukuba
-
OGAWA Osamu
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
LEE Myoungbum
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
AMIAKA Toshio
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
KASUYA Tooru
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
CHIKYOW Toyohiro
Advanced Electronic Materials Center, National Institute for Materials Science
-
NAKAMURA Kunio
Semiconductor Leading Edge Technologies, Inc. (Selete)
-
Yamamoto K
Kaneka Corporation
-
Kasuya Tooru
Semiconductor Leading Edge Technologies Inc. (selete)
-
Arikado Tsunetoshi
Semiconductor Leading Edge Technologies Inc. (selete)
-
Lee Myoungbum
Semiconductor Leading Edge Technologies Inc. (selete)
-
Nakamura Genji
Semiconductor Leading Edge Technologies Inc. (selete)
-
Ikoma Toru
Institute Of Fluid Science Tohoku University
-
Kadomura Shingo
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
-
Iwamoto Hayato
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
-
IKUTA Tetsuya
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
-
MIYANAMI Yuki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
-
FUJITA Shigeru
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
-
Miyanami Yuki
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
-
KUTSUKI Katsuhiro
Graduate School of Engineering, Osaka University
-
OKAMOTO Gaku
Graduate School of Engineering, Osaka University
-
HOSOI Takuji
Graduate School of Engineering, Osaka University
-
Okamoto Gaku
Graduate School Of Engineering Osaka University
-
Kutsuki Katsuhiro
Graduate School Of Engineering Osaka University
-
Ikuta Tetsuya
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
-
Fujita Shigeru
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
著作論文
- Low-Leakage-Current Ultra-thin SiO_2 Film by Low-Temperature Neutral Beam Oxidation
- Modified Oxygen Vacancy Induced Fermi Level Pinning Model Extendable to P-Metal Pinning
- In-situ Doped Si Selective Epitaxial Growth for Raised Source/Drain Extension CMOSFET
- Characteristics of Pure Ge_3N_4 Dielectric Layers Formed by High-Density Plasma Nitridation