Ikuta Tetsuya | Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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概要
- IKUTA Tetsuyaの詳細を見る
- 同名の論文著者
- Semiconductor Technology Development Division Semiconductor Business Group Sony Corporationの論文著者
関連著者
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Kadomura Shingo
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Iwamoto Hayato
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Ikuta Tetsuya
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Fujita Shigeru
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Miyanami Yuki
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Yasutake Kiyoshi
Graduate School Of Engineering Osaka University
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IWAMOTO Hayato
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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KADOMURA Shingo
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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IKUTA Tetsuya
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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MIYANAMI Yuki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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FUJITA Shigeru
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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Shimura Takayoshi
Graduate School Of Engineering Osaka University
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Shimura Takayoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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WATANABE Heiji
Graduate School of Engineering, Osaka University
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Yasutake Kiyoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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SHIMURA Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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SHIMURA Takayoshi
Graduate School of Engineering, Osaka University
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Yasutake K
Graduate School Of Engineering Osaka University
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Kadomura Shingo
Semiconductor Technology Development Group, Semiconductor Business Unit, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Miyanami Yuki
Semiconductor Technology Development Group, Semiconductor Business Unit, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Shimura Takayoshi
Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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YASUTAKE Kiyoshi
Graduate School of Engineering, Osaka University
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Yasutake Kiyoshi
Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Iwamoto Hayato
Semiconductor Technology Development Group, Semiconductor Business Unit, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Fujita Shigeru
Semiconductor Technology Development Group, Semiconductor Business Unit, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Fujita Shigeru
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Ikuta Tetsuya
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
著作論文
- In-situ Doped Si Selective Epitaxial Growth for Raised Source/Drain Extension CMOSFET
- Atmospheric In-situ Arsenic-Doped SiGe Selective Epitaxial Growth for Raised Extension NMOSFET
- Atmospheric In situ Arsenic-Doped SiGe Selective Epitaxial Growth for Raised-Extension N-type Metal–Oxide–Semiconductor Field-Effect Transistor
- Investigation of In-situ Boron-Doped Si Selective Epitaxial Growth by Comparison with Arsenic Doping