In-situ Doped Si Selective Epitaxial Growth for Raised Source/Drain Extension CMOSFET

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• WATANABE Heiji

  Graduate School of Engineering, Osaka University

• Yasutake Kiyoshi

  Graduate School Of Engineering Osaka University

• SHIMURA Takayoshi

  Department of Material and Life Science, Graduate School of Engineering, Osaka University

• IWAMOTO Hayato

  Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation

• KADOMURA Shingo

  Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation

• Kadomura Shingo

  Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation

• Watanabe Heiji

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Watanabe Heiji

  Graduate School Of Engineering Osaka University

• Iwamoto Hayato

  Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation

• IKUTA Tetsuya

  Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation

• MIYANAMI Yuki

  Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation

• FUJITA Shigeru

  Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation

• SHIMURA Takayoshi

  Graduate School of Engineering, Osaka University

• Miyanami Yuki

  Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation

• Yasutake K

  Graduate School Of Engineering Osaka University

• Ikuta Tetsuya

  Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation

• Shimura Takayoshi

  Graduate School Of Engineering Osaka University

• Shimura Takayoshi

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Fujita Shigeru

  Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation

• YASUTAKE Kiyoshi

  Graduate School of Engineering, Osaka University

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