Impact of PVD-based In-situ Fabrication Method for Metal/High-k Gate Stacks
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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Yasutake Kiyoshi
Graduate School Of Engineering Osaka University
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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Minami Takashi
Canon Anelva Corporation
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HORIE Shinya
Graduate School of Engineering, Osaka University
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KITANO Naomi
Canon ANELVA Corporation
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KOSUDA Motomu
Canon ANELVA Corporation
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Horie Shinya
Graduate School Of Engineering Osaka University
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