High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• KAKIUCHI Hiroaki

  Department of Precision Science and Technology, Osaka University

• MORI Yuzo

  Department of Precision Science and Technology, Osaka University

• YASUTAKE Kiyoshi

  Department of Precision Engineering, Faculty of Engineering, Osaka University

• Yasutake Kiyoshi

  Graduate School Of Engineering Osaka University

• Yasutake K

  Osaka Univ. Osaka

• Yasutake Kiyoshi

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Kakiuchi Hiroaki

  Department Of Precision Science And Technology Graduate School Of Engineering Osaka University

• Mori Yuzo

  Department Of Applied Physics Faculty Of Engineering Osaka City University

• Yasutake K

  Graduate School Of Engineering Osaka University

• OHMI Hiromasa

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University

• KUWAHARA Yasuhito

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University

• MATSUMOTO Mitsuhiro

  SANYO Electric Co., Ltd.

• EBATA Yusuke

  SHARP Co., Ltd.

• YOSHII Kumayasu

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University

• Mori Yuzo

  Osaka University Dept. Of Precision Science And Technology Graduate School Of Eng.

• Ohmi Hajime

  School Of Engineering Nagoya University

• Ebata Yusuke

  Sharp Corporation Production Technology Development Center

• Kuwahara Yasuhito

  Department Of Precision Science And Technology Graduate School Of Engineering Osaka University

• Matsumoto Mitsuhiro

  Sanyo Electric Co. Ltd.

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