High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells Using Very High Frequency Plasma at Atmospheric Pressure

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概要

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• We have investigated the electrical and optical properties of hydrogenated amorphous silicon (a-Si:H) films prepared with extremely high deposition rates using very high frequency (VHF) plasma of gas mixtures containing He, H2, and SiH4 at atmospheric pressure. VHF power is a very important deposition parameter governing the dissociation of SiH4 molecules and the structural relaxation of the film. When the deposition parameters are optimized, the optical gap of the film can be controlled by the H2/SiH4 ratio without appreciable deterioration in photoconductivity. On the basis of the results, the a-Si:H films have been applied to the intrinsic layers (i-layers) of p–i–n single-junction solar cells. An initial efficiency of 8.25% is obtained for the cell with an i-layer prepared at a very high deposition rate of 128.1 nm/s. However, the results suggest that unknown factors limiting cell performance still exist in the fabrication process of a-Si:H solar cells.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-04-30

著者

• Yasutake Kiyoshi

  Department Of Material And Life Science Graduate School Of Engineering Osaka University

• Kakiuchi Hiroaki

  Department Of Precision Science And Technology Graduate School Of Engineering Osaka University

• Mori Yuzo

  Department Of Applied Physics Faculty Of Engineering Osaka City University

• OHMI Hiromasa

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University

• EBATA Yusuke

  SHARP Co., Ltd.

• YOSHII Kumayasu

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University

• Kuwahara Yasuhito

  Department Of Precision Science And Technology Graduate School Of Engineering Osaka University

• Matsumoto Mitsuhiro

  Sanyo Electric Co. Ltd.

• Yoshii Kumayasu

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

• Mori Yuzo

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

• Ebata Yusuke

  SHARP Co., Ltd., 2613-1 Ichinomoto, Tenri, Nara 632-8567, Japan

• Kuwahara Yasuhito

  Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan

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