YASUTAKE Kiyoshi | Department of Precision Engineering, Faculty of Engineering, Osaka University
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概要
関連著者
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YASUTAKE Kiyoshi
Department of Precision Engineering, Faculty of Engineering, Osaka University
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Yasutake Kiyoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Yasutake K
Graduate School Of Engineering Osaka University
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Yasutake Kiyoshi
Graduate School Of Engineering Osaka University
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UMENO Masataka
Department of Precision Engineering, Faculty of Engineering, Osaka University
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Yasutake K
Osaka Univ. Osaka
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WATANABE Heiji
Department of Precision Science and Technology, Osaka University
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KAKIUCHI Hiroaki
Department of Precision Science and Technology, Osaka University
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Umeno Masataka
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kakiuchi Hiroaki
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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OHMI Hiromasa
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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SHIMURA Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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Umeno M
Fukui Univ. Technol. Fukui Jpn
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KAWABE Hideaki
Department of Precision Engineering, Faculty of Engineering, Osaka University
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Kawabe H
Tatsuta Electric Wire & Cable Co. Ltd. Osaka
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Kawabe Hideaki
Department Of Applied Physics Faculty Of Engineering Osaka University
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Kawabe H
Osaka Polytechnic College
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FUKUDA Kazunori
Department of Oriental Medicine, Gifu University School of Medicine
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Yoshida Takayoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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YOSHII Kumayasu
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Ohmi Hajime
School Of Engineering Nagoya University
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MORI Yuzo
Department of Precision Science and Technology, Osaka University
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Hamakawa Y
Ritsumeikan Univ. Shiga Jpn
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Science Osaka University
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NISHINO Taneo
Department of Electrical and Electronics Engineering, Kobe University
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NISHINO Taneo
Institute of Natural Science, Kobe University
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NAKAYAMA Hiroshi
Department of Electrical Engineering, Faculty of Engineering Science, Osaka University
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Watanabe Heiji
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Nishino Taneo
Department Of Electrical And Electronics Engineering Kobe University
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Nishino Taneo
Division Of Science And Materials The Graduate School Of Science And Technology Kobe University:depa
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Nishino Taneo
Department Of Electrical And Electronics Engineering Faculty Of Engineering Kobe University
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Mori Yuzo
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Hamakawa Yoshihiro
Department Of Electrical Engineering Faculty Of Engineering Osaka University
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Mori Yuzo
Osaka University Dept. Of Precision Science And Technology Graduate School Of Eng.
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Shimura Takayoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Nishino T
Kobe Univ. Kobe Jpn
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Nakayama Hiroshi
Department Of Electrical Engineering Faculty Of Engineering Himeji Institute Of Technology
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Nishino Taneo
Division Of Science And Materials The Graduate School Of Science And Technology Kobe University:depa
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Nakayama Hiroshi
Department of Applied Physics, Osaka City University, Osaka 558-8585
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YAMADA Keisaku
Nanotechnology Research Laboratories, Waseda University
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Fukuda Kazunori
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Yoshida Takayoshi
Department Of Health And Sport Sciences Graduate School Of Medicine Osaka University
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YOSHIDA Shiniti
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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WATANABE Yasumasa
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Yamamoto K
Kaneka Corporation
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TAWARA Naotaka
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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WAKAMIYA Takuya
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Yoshida Takayoshi
Department Of Heaith And Sports Sciences Osaka University
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IIDA Satoshi
Department of Physics,Kwansei-Gakuin University
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Nakajima Kaoru
Dep. Of Micro Engineering Kyoto Univ.
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CHIKYOW Toyohiro
National Institute for Mateirals Science
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Umezawa Naoto
National Inst. For Materials Sci. Ibaraki Jpn
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NARA Yasuo
Semiconductor Leading Edge Technologies, Inc.
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KAMIYAMA Satoshi
Semiconductor Leading Edge Technologies, Inc.
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SHIRAISHI Kenji
Institute of Physics, University of Tsukuba
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Nara Yasuo
Semiconductor Leading Edge Technologies Inc. (selete)
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Yasutake K
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Umeno Masataka
Department Of Management And Information Science Faculty Of Engineering Fukui University Of Technolo
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Umeno Masataka
Department Of Management Science Faculty Of Engineering Fukui University Of Technology
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Fukuda K
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Kamiyama Satoshi
Semiconductor Leading Edge Technologies Inc.
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YAMADA Keisaku
Waseda Univ.
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AKASAKA Yasushi
Semiconductor Leading Edge Technologies Inc.
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ARIKADO Tsunetoshi
Semiconductor Leading Edge Technologies Inc.
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ADACHI Kaoru
Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University
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NAKAMURA Kunio
Semiconductor Leading Edge Technologies, Inc. (Selete)
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TATSUMI Toru
System Devices Research Laboratories, NEC Corporation
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Yasutake Kiyoshi
Osaka Univ. Osaka Jpn
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Arikado Tsunetoshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Manabe Katsuya
System Devices Research Laboratories Nec Corporation
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Yamada Keisaku
Graduate School Of Pure And Applied Sciences University Of Tsukuba
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Terai Yoshikazu
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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NISHIJIMA Kenichi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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FUJIWARA Yasufumi
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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KUWAHARA Yasuhito
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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MATSUMOTO Mitsuhiro
SANYO Electric Co., Ltd.
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EBATA Yusuke
SHARP Co., Ltd.
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KONISHI Yoshito
Department of Precision Engineering, faculty of Engineering, Osaka University
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Wakamiya Takuya
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Nakamura Kunio
Semiconductor Leading Edge Technologies Inc. (selete)
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NAKAMURA Ryota
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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AKETA Masatoshi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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MANABE Kenzo
System Devices Research Laboratories, NEC Corporation
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Watanabe Yasumasa
Department Of Chemical Pharmacology Faculty Of Pharmaceutical Sciences The University Of Tokyo
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Adachi Kaoru
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Adachi Kaoru
Department Of Precision Engineering Faculty Of Engineering Osaka University
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HASE Takashi
System Devices Research Laboratories, NEC Corporation
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MURAKAMI Junichi
Department of Electrontcs and Informatics, Faculty of Engineering, Toyama Prefectural University
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Nara Yasuo
Semiconductor Leading Edge Technologies Inc.
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Yamada Keisaku
Nanotechnology Research Laboratories Waseda University
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Ebata Yusuke
Sharp Corporation Production Technology Development Center
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Yoshida Shiniti
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Kuwahara Yasuhito
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Shimura Takayoshi
Graduate School Of Engineering Osaka University
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Watanabe Yasumasa
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Fujiwara Yasufumi
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Murakami Junichi
Department Of Electrontcs And Informatics Faculty Of Engineering Toyama Prefectural University
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Murakami Junichi
Department Of Precision Engineering Faculty Of Engineering Osaka Unviersity
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Tawara Naotaka
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Matsumoto Mitsuhiro
Sanyo Electric Co. Ltd.
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Nakamura Kunio
Semiconductor Leading Edge Technologies Inc.
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AKASAKA Yasushi
Semiconductor Leading Edge Technologies, Inc.
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YASUTAKE Kiyoshi
Graduate School of Engineering, Osaka University
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Yoshida Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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WATANABE Yasumasa
Department of Aeronautics and Astronautics, The University of Tokyo
著作論文
- Measurement of Residual Stress in Bent Silicon Wafers by Means of Photoluminescence
- Oxygen-Related Donors Stable at 700-800℃ in CZ-Si Crystals
- Oxygen-Related Donors Generated at 800℃ in CZ-Si
- White X-ray Topography of Lattice Undulation in Bonded Silicon-on-Insulator Wafers
- Synchrotron X-Ray Topography of Lattice Undulation of Bonded Silicon-On-Insulator Wafers
- Observation of Lattice Undulation of Commercial Bonded Silicon-On-Insulator Wafers by Synchrotron X-Ray Topography : Structure and Mechanical and Thermal Properties of Condensed Matter
- Large-Area X-Ray Topographs of Lattice Undulation of Bonded Silicon-On-Insulator Wafers
- Thermal Degradation of HfSiON Dielectrics Caused by TiN Gate Electrodes and Its Impact on Electrical Properties
- Role of Nitrogen Incorporation into Hf-Based High-k Gate Dielectrics for Termination of Local Current Leakage Paths
- Low-Temperature Crystallization of Amorphous Silicon by Atmospheric-Pressure Plasma Treatment in H_2/He or H_2/Ar Mixture
- Low-Temperature Growth of Epitaxial Si Films by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Porous Carbon Electrode
- Characterization of Epitaxial Silicon Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition at Low Temperatures (450-600℃)
- High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure
- High-Rate Growth of Defect-Free Epitaxial Si at Low Temperatures by Atmospheric Pressure Plasma CVD
- Size and Density Control of Crystalline Ge Islands on Glass Substrates by Oxygen Etching
- Fracture of GaAs Wafers : Mechanical and Acoustical Properties
- Structural Characterization of Polycrystalline 3C-SiC Films Prepared at High Rates by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Monomethylsilane
- Mechanism of Suppressed Change in Effective Work Functions for Impurity-Doped Fully Silicided NiSi Electrodes on Hf-Based Gate Dielectrics
- Mechanical Properties of Heat-treated CZ-Si Wafers from Brittle to Ductile Temperature Range