KAKIUCHI Hiroaki | Department of Precision Science and Technology, Osaka University
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概要
関連著者
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KAKIUCHI Hiroaki
Department of Precision Science and Technology, Osaka University
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YASUTAKE Kiyoshi
Department of Precision Engineering, Faculty of Engineering, Osaka University
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Yasutake Kiyoshi
Graduate School Of Engineering Osaka University
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Kakiuchi Hiroaki
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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OHMI Hiromasa
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Yasutake K
Graduate School Of Engineering Osaka University
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WATANABE Heiji
Department of Precision Science and Technology, Osaka University
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Yasutake K
Osaka Univ. Osaka
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Yasutake Kiyoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Ohmi Hajime
School Of Engineering Nagoya University
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MORI Yuzo
Department of Precision Science and Technology, Osaka University
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Watanabe Heiji
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Mori Yuzo
Department Of Applied Physics Faculty Of Engineering Osaka City University
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Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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YOSHII Kumayasu
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Mori Yuzo
Osaka University Dept. Of Precision Science And Technology Graduate School Of Eng.
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TAWARA Naotaka
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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WAKAMIYA Takuya
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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有馬 健太
阪大院工
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遠藤 勝義
阪大院工
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IKEDA Manabu
Department of Psychiatry and Neuropathobiology, Faculty of Medical and Pharmaceutical Sciences, Kuma
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ENDO Katsuyoshi
Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka Un
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MORI Yuzo
Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka Un
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ARIMA Kenta
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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MORITA Mizuho
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Hirose K
Department Of Precision Science And Technology Osaka University
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SHIMURA Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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Terai Yoshikazu
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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NISHIJIMA Kenichi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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FUJIWARA Yasufumi
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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KUWAHARA Yasuhito
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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MATSUMOTO Mitsuhiro
SANYO Electric Co., Ltd.
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EBATA Yusuke
SHARP Co., Ltd.
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Wakamiya Takuya
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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NAKAMURA Ryota
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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AKETA Masatoshi
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Ebata Yusuke
Sharp Corporation Production Technology Development Center
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Kuwahara Yasuhito
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Fujiwara Yasufumi
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Tawara Naotaka
Department Of Precision Science And Technology Graduate School Of Engineering Osaka University
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Matsumoto Mitsuhiro
Sanyo Electric Co. Ltd.
著作論文
- Visible Light Irradiation Effects on STM Observations of Hydrogenated Amorphous Silicon Surfaces
- Low-Temperature Crystallization of Amorphous Silicon by Atmospheric-Pressure Plasma Treatment in H_2/He or H_2/Ar Mixture
- Low-Temperature Growth of Epitaxial Si Films by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Porous Carbon Electrode
- Characterization of Epitaxial Silicon Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition at Low Temperatures (450-600℃)
- High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure
- High-Rate Growth of Defect-Free Epitaxial Si at Low Temperatures by Atmospheric Pressure Plasma CVD
- Size and Density Control of Crystalline Ge Islands on Glass Substrates by Oxygen Etching
- Structural Characterization of Polycrystalline 3C-SiC Films Prepared at High Rates by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Monomethylsilane