Correlation Between Surface Topography and Static Capacitance Image of Ultrathin SiO2 Films Evaluated by Scanning Capacitance Microscopy
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概要
- 論文の詳細を見る
We performed scanning capacitance microscopy (SCM) using a self-sensing conductive probe to investigate the relationships between the surface morphology, oxide thickness variation, and subsurface depletion layer of ultrathin SiO2 films on $ p^{-}$-Si substrates. First, upon analyzing the two-dimensional cross-correlation between $dC/dZ$ images and simultaneously obtained topography images, we found that the dopant concentration of the Si substrates affects the correlation, and this can be attributed to the spatial inhomogeneities in the depletion layer formed by the SCM probe tip. We considered these depletion layer inhomogeneities to reflect the individual dopant distribution within the substrates. Second, from the surface roughness and spatial deviation of the $dC/dZ$ images as well as the cross-correlation analysis results, we concluded that the surface roughness directly corresponds to the spatial variation in SiO2 film thickness.
- 2007-09-15
著者
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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Nishida Akio
MIRAI, Semiconductor Leading Edge Technologies (Selete), Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ando Atsushi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kamohara Siro
MIRAI, Semiconductor Leading Edge Technologies (Selete), Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Naitou Yuichi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ogiso Hisato
Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
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Yano Fumiko
MIRAI, Semiconductor Leading Edge Technologies (Selete), Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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