Feedback Control System of Cantilever Contact Conditions during Conducting Atomic Force Microscopy Spectroscopy Measurements
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概要
- 論文の詳細を見る
We built a feedback control system for conducting atomic force microscopy (AFM) spectroscopy measurements. This system can compensate for the torsional displacement between the cantilever and sample surface with a reverse stage movement according to the error of cantilever tilt signal (FMM). Therefore, the system is effective for long-term electrical measurements at one point without the effect of torsional drift. In addition, we describe the results of applying this feedback control system to electrical measurements of thin SiO2 film.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-08-30
著者
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Ando Atsushi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ando Atsushi
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Oohira Tsunehiro
Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
関連論文
- Tip-to-Sample Distance Dependence of $dC/dZ$ Imaging in Thin Dielectric Film Measurement
- Correlation Between Surface Topography and Static Capacitance Image of Ultrathin SiO2 Films Evaluated by Scanning Capacitance Microscopy
- Monitoring Conditions of Cantilever during Conducting Atomic Force Microscopy Spectroscopy Measurements
- Feedback Control System of Cantilever Contact Conditions during Conducting Atomic Force Microscopy Spectroscopy Measurements