Fuyuki T | Nara Inst. Sci. And Technol. Nara Jpn

スポンサーリンク

概要

関連著者

もっと見る

著作論文

Novel Stacked Nanodisk with Quantum Effect Fabricated by Defect-free Chlorine Neutral Beam Etching
A New Silicon Quantum-Well Structure with Controlled Diameter and Thickness Fabricated with Ferritin Iron Core Mask and Chlorine Neutral Beam Etching
Cracking of Saturated Hydrocarbon Gas Molecular Beam for Carbonization of Si(001) Surface
Interface Modification by Hydrocarbon Gas Molecular Beams in Heteroepitaxy of SiC on Si
Enhancement of crystal growth rate of Bio-Nano Crystallization by Pulsed Rapid Thermal Annealing
Tunneling Current in a-Si:H/a-Si_C_x:H Multilayer Structures
Effects of Deposition Conditions on Properties of a-Si_C_x:H Diagnosed Using Optical Emission Spectroscopy
Carrier Injection/Transport Characteristics of Photochromic Diarylethene Film : Surfaces, Interfaces, and Films
Solution Electrochemiluminescent Cell with a High Luminance Using an Ion Conductive Assistant Dopant Optics and Quantum Electronics
Solution Electrochemiluminescent Cell Using Tris(phenylpyridine) Iridium : Optics and Quantum Electronics
Heteroepitaxial Growth of InGaP on Si with InGaP/GaP Step-graded Buffer Layers
Structure Analysis of A-Si_C_x:H with Dominant Tetrahedral Si-C Bonds Deposited by Hybrid-Plasma Chemical Vapor Deposition
Time-Resolved Reflection High-Energy Electron Diffraction Analysis in Initial Stage of 3C-SiC Growth on Si(001) by Gas Source Molecular Beam Epitaxy
Optimization of Silicon-Based 2-Terminal Tandem Solar Cells with GaAs_P_x and InGa_P_x as Top Cell Material
Quantitative Analysis for CH_3 Radicals in Low-Temperature Growth of 3C-SiC on Si(001) Clean Surface
Deposition Mechanisms of SiO_2 in Remote Plasma Chemical Vapor Deposition Analyzed by Spatially Resolved Mass Spectroscopy ( Plasma Processing)
Single Crystalline Si Metal/Oxide/Semiconductor Field-Effect Transistors Using High-Quality Gate SiO_2 Deposited at 300℃ by Remote Plasma Technique
Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique : Etching and Deposition Technology
Low-Temperature Deposition of Hydrogen-Free Silicon Oxynitride without Stress by the Remote Plasma Technique
Optimum Designing of Single Crystalline Silicon Thin Film Solar Cells with Graded Active Layer : Semiconductors
Reliability of Low Temperature Poly-Si GOLD (Gate-Overlapped LDD) Structure TFTs(Special Issue on Electronic Displays)
Low Density of Gap States in a-Si:H Deposited by Vacuum UV Direct Photochemical Vapor Deposition Method
Electron Spin Resonance and Photoluminescence in a-Si_C_x:H Deposited at Low Substrate Temperature
Hot Electron Conduction in a-Si:H/a-Si_C_:H Super Structure

もっと見る

スポンサーリンク