Shirafuji Tatsuru | Department Of Electrical Engineering Kyoto University
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概要
関連著者
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Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
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SHIRAFUJI Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology
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Tachibana Kunihide
Department Of Electronic Science And Engineering Kyoto University
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Hayashi Yasuaki
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Shirafuji T
Kyoto Univ. Kyoto Jpn
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Tachibana Kunihide
Department of Electronic Science and Engineering, Kyoto University
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Saito Nagahiro
Department Of Materials Processing And Engineering Graduate School Of Engineering Nagoya University
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Nishino Shigehiro
Department Of Electrical Engineering Kyoto University
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Takai Osamu
Materials and Surface Engineering Research Institute, Kanto Gakuin University, Yokohama 236-0004, Japan
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林 康明
京都工芸繊維大学大学院
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橘 邦英
愛媛大学大学院工学研究科電子情報工学専攻
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林康 明
京都工芸繊維大学工芸学部電子情報工学科
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HAYASHI Yasuaki
Department of Electronics and Information Science, Kyoto Institute of Technology
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NISHINO Shigehiro
Department of Electronics and Information Science, Kyoto Institute of Technology
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林 康明
京都工芸繊維大学大学院工芸科学研究科
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Hayashi Yutaka
Device Synthesis Section Electrotechnical Laboratory
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Hayashi Yuzo
Irie Koken Co. Ltd.
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Hayashi Y
Irie Koken Co. Ltd. Saitama Jpn
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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HAYASHI Yasuaki
Kyoto Institute of Technology
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Hayashi Yasuaki
Institute For Super Materials Ulvac Japan Ltd.
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Hayashi Yasuaki
Department Of Electronics Kyoto Institute Of Technology
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Hayashi Yasuaki
Department Of Neurology Okayama National Hospital
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Nishino Shigehiro
Department Of Electrical Engineering Technical College Kyoto Institute Of Technology
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology
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MATSUI Yasuji
Central Research Laboratory, Mitsubishi Electric Corp.
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Muto Y
The Institute For Materials Research Tohoku University
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Nishino S
Kyoto Inst. Technol. Kyoto Jpn
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Noguchi Yohei
Department Of Life And Earth Sciences Graduate School Of Science And Technology Chiba University
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Matsui Yasuji
Central Research Laboratory Mitsubishi Electric Corp.
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Nakagami Yuko
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Hieda Junko
Institute For Materials Research Tohoku University
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Nojima Kazuhiro
Toyo Jushi Corporation, Komaki, Aichi 485-0805, Japan
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Tsuchimoto Akiharu
Toyo Jushi Corporation, Komaki, Aichi 485-0805, Japan
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Yamamoto Taibou
Department of Materials, Physics and Energy Engineering, Nagoya University, Nagoya 464-8603, Japan
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Okabe Youji
Toyo Jushi Corporation, Komaki, Aichi 485-0805, Japan
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Shirafuji Tatsuru
Department of Physical Electronics and Informatics, Osaka City University, Osaka 558-8585, Japan
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Himeno Yuta
Department of Physical Electronics and Informatics, Osaka City University, Osaka 558-8585, Japan
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WANG Yun
Department of Medicine and Science in Sports and Exercise, Tohoku University Graduate School of Medi
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Matsunami H
Kyoto Univ. Kyoto Jpn
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MATSUNAMI Hiroyuki
Department of Electronic Science & Engineering, Kyoto University
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FUYUKI Takashi
Department of Electrical Engineering, Kyoto University
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Fuyuki Takashi
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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YOSHIMOTO Masahiro
Department of Electrical Engineering, Kyoto University
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Nakajima Shigeki
Department Of Electrical Engineering Faculty Of Science And Technology Kinki University
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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Yoshimoto Masahiro
Department Of Electrical Engineering Kyoto University
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Nakajima Sadanojo
Department Of Electrical And Electronic Engineering The University Of Tokushinna
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Ueda Jun
Department Of Electronics And Information Science Faculty Of Engineering And Design Kyoto Institute
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Wang Yun
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Li Xi
Department Of Veterinary Medicine Zhangjiakou Agricultural College
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Yoshimoto M
Materials And Structures Laboratory Tokyo Institute Of Technology
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Wang Yun
Department Of Chemistry Northwest Normal University
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Li Xiaoyu
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Fuyuki T
Nara Inst. Sci. And Technol. Nara Jpn
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Nakajima S
Ntt Electronics Corp.
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Yamamuka M
Mitsubishi Electric Corp. Hyogo Jpn
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Yamamuka Mikio
Department Of Electronics And Information Science Kyoto Institute Of Technology
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KONDO Hisao
Department of Materials Science and Engineering, Nagoya Institute of Technology
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NAKAJIMA Sagara
Department of Electronics and Information Science, Kyoto Institute of Technology
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GENJI Takeshi
Department of Electronics and Information Science, Kyoto Institute of Technology
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Nogiwa Seiji
Optical Measurement Technology Development Co. Ltd.:ando Electric Co. Ltd.
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Chen Wei-ming
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Genji Takeshi
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Yoshimoto M
Kyoto Inst. Technol. Kyoto Jpn
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Fuyuki Takashi
Department Of Eectrical Engineering Kyoto University
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Matsunami Hiroyuki
Department Of Electrical Engineering Kyoto University
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MORITA Tatsuo
Central Research Laboratories, SHARP Corporation
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Morita Tatsuo
Central Research Laboratory Sharp Corporation
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MIYAZAKI Yasuo
Department of Tumor Pathology, Gifu University Graduate School of Medicine
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Sawada Mahito
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Miyazaki Yasuo
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Miyazaki Yasuo
Department Of Applied Physics And Physico-informatics Keio University
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LILOV Stanislav
Department of Semiconductor Physics, Faculty of Physics, University of Sofia
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Nakagami Yuko
Department of Electronics and Information Science, Kyoto Institute of Technology
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Li Xi
Department Of Biochemistry And Molecular Biology Tianjin Medical University Cancer Institute And Hos
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NISHIONO Shigehiro
Department of Electronics and Information Science, Kyoto Institute of Technology
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MAEKAWA Shinji
Central Research Laboratory, SHARP Corporation
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Tachibana Kunihide
Department Of Electronics And Information Science Kyoto Institute Of Technology:(present Address) De
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MURAISHI Shuichi
Application and Research Center, JEOL Ltd.
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Shirafuji Tatsuru
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Kondo Hisao
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Maekawa Shinji
Central Research Laboratory Sharp Corporation
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Lilov Stanislav
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Nakamura Akihiro
Department Of Applied Chemistry And Biotechnology Faculty Of Engineering Yamanashi University
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Matsunami Hiroyuki
Department Of Eectrical Engineering Kyoto University
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Muraishi Shuichi
Application And Research Center Jeol Ltd.
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Wang Yun
Department Of Anesthesiology Huashan Hospital Fudan University
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Nishiono Shigehiro
Department Of Electronics And Information Science Kyoto Institute Of Technology
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Fujii Tadashi
the Graduate School of Materials Science, Nara Institute of Science and Technology
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Hayashi Yasuaki
Department of Electronics and Information Science, Kyoto Institute of Technology,
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Shirafuji Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology,
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Sawada Mahito
Department of Electronics and Information Science, Kyoto Institute of Technology,
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Denpoh Kazuki
Yamanashi Technology Development Center, Tokyo Electron AT Ltd., 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan
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Kazuki Denpoh
Yamanashi Technology Development Center, Tokyo Electron AT Ltd., 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan
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Cho Sung-Pyo
Department of Materials, Physics and Energy Engineering, Nagoya University, Nagoya 464-8603, Japan
著作論文
- Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films
- Measurement of SiH_2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deporsition of Hydrogenated Amorphous Silicon Film
- Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon : Effects of Excitation Wavelengths and Source Gases
- Diamond Nucleation on Singlecrystalline 6H-SiC Substrates by Bias-Enhanced Nucleation in Hot Filament Chemical Vapor Deposition
- Monte-Carlo Simulation of Surface Reactions in Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films
- Plasma Copolymerization of Tetratluoroethylene/Hexamethyldisiloxane and In Situ Fourier Transform Infrared Spectroscopy of Its Gas Phase
- Low Density of Gap States in a-Si:H Deposited by Vacuum UV Direct Photochemical Vapor Deposition Method
- PE-CVD of Thermally Stable Low-k IMD Films Using Low-GWPC_5F_8
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics
- Preparation of Stable F-Doped SiO 2 Thin Films from Si(NCO) 4/SiF 4/O 2 Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source
- Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: Incorporating Ion Density Oscillation at Low Frequency
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water
- Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Gold Nanoparticle Synthesis Using Three-Dimensionally Integrated Micro-Solution Plasmas
- Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6