Hayashi Yasuaki | Department of Electronics and Information Science, Kyoto Institute of Technology,

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概要

関連著者

Hayashi Yasuaki
Department Of Electronics And Information Science Kyoto Institute Of Technology
Nishino Shigehiro
Department Of Electrical Engineering Kyoto University
Sawada Mahito
Department Of Electronics And Information Science Kyoto Institute Of Technology
Nakagami Yuko
Department Of Electronics And Information Science Kyoto Institute Of Technology
Shirafuji Tatsuru
Department Of Electrical Engineering Kyoto University
Hayashi Yasuaki
Department of Electronics and Information Science, Kyoto Institute of Technology,
Shirafuji Tatsuru
Department of Electronics and Information Science, Kyoto Institute of Technology,
Sawada Mahito
Department of Electronics and Information Science, Kyoto Institute of Technology,

著作論文

Preparation of Stable F-Doped SiO 2 Thin Films from Si(NCO) 4/SiF 4/O 2 Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source

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